Substrate assembly for gas discharge panel, process for manufacturing the same, and gas discharge panel
View Patent ↗A substrate assembly for a gas discharge panel, comprising a dielectric layer and a protective layer of MgO being formed in this order on a substrate having electrodes, wherein the dielectric layer is a laminate of an organic dielectric layer and an inorganic dielectric layer in this order from a side of the substrate.
1. A process for manufacturing a substrate assembly for a gas discharge panel, comprising:
an organic dielectric layer formed on a substrate;
an inorganic dielectric layer formed on the organic dielectric layer; and
a protective layer of MgO formed on the inorganic dielectric layer,
wherein the organic dielectric layer is obtained by heating a coating film of an organic dielectric material,
the inorganic dielectric layer is obtained by heating a coating film of an inorganic dielectric material formed by a sol-gel process, and
the protective layer is obtained by heating a coating film of an organic compound containing Mg.
2. The process for manufacturing a substrate assembly for a gas discharge panel of claim 1 , wherein
the organic dielectric layer is formed by applying a paste of the organic dielectric material to form the coating film and by firing the resultant coating film,
the inorganic dielectric layer is formed by applying a paste of the inorganic dielectric material on the organic dielectric layer to form the coating film and by firing the resultant coating film, and
the protective layer is formed by applying a paste of the organic compound on the inorganic dielectric layer to form the coating film and by firing the resultant coating film.
3. The process for manufacturing a substrate assembly for a gas discharge panel of claim 1 , wherein
the organic dielectric layer and the inorganic dielectric layer are formed by applying a paste of the organic dielectric material and a paste of the inorganic dielectric material in this order to form each coating film and by firing resultant coating films, and
the protective layer is formed by applying a paste of the organic compound on the inorganic dielectric layer to form the coating film and by firing the resultant coating film.
4. The process for manufacturing a substrate assembly for a gas discharge panel of claim 1 , wherein
the organic dielectric layer, the inorganic dielectric layer and the protective layer are formed by applying a paste of the organic dielectric material, a paste of inorganic dielectric material and a paste of the organic compound in this order to form each coating film and by firing resultant coating films.
5. The process for manufacturing a substrate assembly for a gas discharge panel of claim 1 , wherein the organic dielectric layer is made of a material selected from polyimide, polyamide imide, polysiloxane and polysilazane.
6. The process for manufacturing a substrate assembly for a gas discharge panel of claim 5 , wherein the organic dielectric layer is made of a material selected from polysiloxane and polysilazane each having a side chain selected from a group consisting of alkyl, alkoxy and aryl.
7. The process for manufacturing a substrate assembly for a gas discharge panel of claim 1 , wherein the inorganic dielectric layer is made of a material selected from a group consisting of SiO 2 , Al 2 O 3 , TiO 2 , ZrO 2 , AIN, Si 3 N 4 and SiC, and a mixture of two or more thereof.