Liquid-crystal display device with thin-film transistors and method of fabricating the same
A LCD device prevents corrosion of the transparent conductive layers and contact resistance increase without arising the step coverage degradation due to the thickness increase of the interconnection layer, the step coverage degradation due to the formation of undercut portions, and productivity reduction and fabrication cost increase. A first interconnection line comprising a patterned Al or Al alloy layer is disposed on or over an insulating plate. A first insulating layer is formed to cover the first interconnection line to have a contact hole exposing a part of the first interconnection line. A first conductive material made of a plated metal is in contact with the exposed part of the first interconnection line in the contact hole. A first transparent conductive layer is in contact with the first conductive material. The first transparent conductive layer is electrically connected to the first interconnection line by way of the first conductive material.
1. A liquid-crystal display device comprising:
a first interconnection line comprising a patterned Al or Al alloy layer, disposed directly on an insulating plate or over the plate by way of an underlying insulating layer:
a first insulating layer formed on the plate to cover the first interconnection line, the first insulating layer having a contact hole that exposes a part of the first interconnection line;
a first conductive material made of a plated metal, the first conductive material being in contact with the exposed part of the first interconnection line in the contact hole in such a way as to cover the whole exposed part thereof; and
a first transparent conductive layer in contact with the first conductive material;
wherein the first transparent conductive layer is electrically connected to the first interconnection line by way of the first conductive material.
2. The device according to claim 1 , wherein the first conductive material is disposed only in the contact hole of the first insulating layer.
3. The device according to claim 1 , wherein the first interconnection line is a gate electrode line.
4. The device according to claim 1 , wherein the first conductive material is less in width than the first interconnection line.
5. The device according to claim 4 , wherein a bottom of the first conductive material is in a same plane as that of the contact hole.
6. The device according to claim 1 , wherein the first conductive material is one selected from the group consisting of Ni, Ag, Au and Cr.
7. The device according to claim 1 , wherein the first interconnection line has a single-layer structure comprising a patterned Al or Al alloy layer.
8. The device according to claim 1 , wherein the first interconnection line has a multiple-layer structure comprising a patterned Al or Al alloy layer and a patterned conductive layer stacked beneath the Al or Al alloy layer; and
the patterned conductive layer is located nearer the plate than the patterned Al or Al alloy layer.
9. The device according to claim 1 , further comprising:
a second interconnection line formed by a patterned Al or Al alloy layer, disposed on the first insulating layer;
a second insulating layer formed on the first insulating layer to cover the second interconnection line, the second insulating layer having a contact hole that exposes a part of the second interconnection line;
a second conductive material made of a plated metal, the second conductive material being in contact with the exposed part of the second interconnection line in the contact hole in such a way as to cover the whole exposed part thereof; and
a second transparent conductive layer in contact with the second conductive material;
wherein the second transparent conductive layer is electrically connected to the second interconnection line by way of the second conductive material.
10. The device according to claim 9 , wherein the first interconnection line is a gate electrode line and the second interconnection line is a drain electrode line.
11. The device according to claim 9 , wherein the second conductive material is one selected from the group consisting of Ni, Ag, Au and Cr.
12. A method of fabricating a LCD device, comprising the steps of:
forming an Al or Al alloy layer directly on an insulating plate or over the plate by way of an underlying insulating layer:
patterning the Al or Al alloy layer to form a first interconnection line;
forming a first insulating layer on the plate to cover the first interconnection line;
selectively etching the first insulating layer to form a contact hole that exposes a part of the first interconnection line;
depositing a metal in the contact hole of the first insulating layer by a plating method, thereby forming a first conductive material in contact with the exposed part of the first interconnection line in such a way as to cover the whole exposed part thereof; and
forming a first transparent conductive layer on the first conductive material to be in contact therewith, thereby electrically connecting the first transparent conductive layer to the first interconnection line by way of the first conductive material.
13. The method according to claim 12 , wherein the first conductive material is disposed only in the contact hole of the first insulating layer.
14. The method according to claim 12 , wherein a gate electrode line is formed by the first interconnection line.
15. The method according to claim 12 , wherein the first conductive material is less in width than the first interconnection line.
16. The method according to claim 12 , wherein the first conductive material is one selected from the group consisting of Ni, Ag, Au and Cr.
17. The method according to claim 12 , wherein an electrolytic plating method is used as the plating method.
18. The method according to claim 12 , further comprising the steps of:
forming a second interconnection line on the first insulating layer by a patterned Al or Al alloy layer;
forming a second insulating layer on the first insulating layer to cover the second interconnection line;
selectively etching the second insulating layer to have a contact hole that exposes a part of the second interconnection line:
depositing a metal in the contact hole of the second insulating layer by a plating method, thereby forming a second conductive material to be in contact with the exposed part of the second interconnection line in the contact hole in such a way as to cover the whole exposed part thereof; and
forming a second transparent conductive layer on the second conductive material to be in contact therewith, thereby electrically connecting the second transparent conductive layer to the second interconnection line by way of the second conductive material.
19. The method according to claim 18 , wherein the first interconnection line is a gate electrode line and the second interconnection line is a drain electrode line.
20. The method according to claim 18 , wherein the second conductive material is one selected from the group consisting of Ni, Ag, Au and Cr.
21. The method according to claim 12 , wherein the first interconnection line has a single-layer structure comprising the patterned Al or Al alloy layer alone.
22. The method according to claim 12 , further comprising the steps of:
forming a conductive layer beneath the Al or Al alloy layer in such a way that the conductive layer is located nearer the plate than the Al or Al alloy layer; and
patterning the conductive layer;
wherein the first interconnection line has a multiple-layer structure comprising the patterned Al or Al alloy layer and the patterned conductive layer stacked beneath the Al or Al alloy layer.