IP Library Granted Patent US 7,880,091
Granted Patent B2
US 7,880,091 · App. 11/645,948 · Granted Feb 1, 2011

Electronic device substrate, electronic device and methods for making same

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Quick Facts
Patent No.
US 7,880,091
App. No.
11/645,948
Granted
Feb 1, 2011
Kind
B2
Abstract

An electronic device substrate having: a base material formed of a thin board; an electrical insulation layer formed on the base material and having plural openings in a thickness direction thereof; and a metal plating layer filled in the plural openings. The base material has a metal layer, a release layer formed contacting the metal layer, and a metal film formed contacting the release layer.

Claims (13)

1. An electronic device substrate, comprising:

a base material formed of a thin board;

an electrical insulation layer formed on the base material and comprising a plurality of openings in a thickness direction thereof;

a metal plating layer filled in the plurality of openings,

the base material comprising a metal layer contacting the metal plating layer, a release layer formed contacting the metal layer, a metal film formed contacting the release layer, and a supporting substrate configured to be separable from the metal layer together with the metal film by using the release layer,

wherein the metal layer, the release layer, the metal film and the supporting substrate are formed in this order from a side of the electrical insulation layer.

2. The electronic device substrate according to claim 1 , wherein:

the base material comprises, formed in order from the electrical insulation layer, the metal layer, the release layer, the metal layer, a tape member, and

an adhesion force between the metal layer and the release layer with the metal film is smaller than that between the metal layer and the electrical insulation layer.

3. The electronic device substrate according to claim 1 , wherein:

the electrical insulation layer comprises a solder resist, a photo-solder resist or a polyimide film.

4. The electronic device substrate according to claim 1 , wherein:

the metal plating layer comprises any one of gold, silver, copper, nickel, palladium, tin, rhodium and cobalt or an alloy thereof or laminated layers each formed of any one thereof or an alloy thereof.