Flash- and ROM-memory
View Patent ↗Method for conversion of a Flash memory cell on a first semiconductor device to a ROM memory cell in a second semiconductor device, the first and second semiconductor device each being arranged on a semiconductor substrate and each comprising an identical device portion and an identical wiring scheme for wiring the device portion to the Flash memory cell and to the ROM memory cell, respectively; the Flash memory cell being made in non-volatile memory technology and comprising an access transistor and a floating transistor, the floating transistor comprising a floating gate and a control gate; the ROM memory cell being made in a baseline technology and comprising a single gate transistor, which method includes manipulating a layout of at least one baseline mask as used in the baseline technology; the manipulation including: incorporating into the layout of the at least one baseline mask a layout of the Flash memory cell, and converting the layout of the Flash memory cell to a layout of one ROM memory cell by eliminating, from the at least one baseline mask, a layout for the floating transistor from the layout of the Flash memory cell and designating the layout of the access transistor of the Flash memory cell as a layout of the single gate transistor of the ROM memory cell.
1. Method for conversion of a Flash memory cell on a first semiconductor device to a ROM memory cell on a second semiconductor device, the first and second semiconductor devices each being arranged on a semiconductor substrate and each comprising an identical device portion and an identical wiring scheme for wiring the device portion to the Flash memory cell and to the ROM memory cell, respectively;
the Flash memory cell being made in non-volatile memory technology using at least one non-volatile technology mask and comprising an access transistor and a floating transistor, the floating transistor comprising a floating gate and a control gate;
the ROM memory cell being made in a baseline technology using at least one baseline mask and comprising a single gate transistor
which method includes manipulating a layout of the at least one baseline mask;
the manipulation comprising:
incorporating into a layout of the at least one baseline mask a layout of the Flash memory cell, and
converting the layout of the Flash memory cell in the at least one baseline mask to a layout of one ROM memory cell by eliminating, from the at least one baseline mask, a layout for the floating transistor from the layout of the Flash memory cell and designating a layout of the access transistor of the Flash memory cell as a layout of the single gate transistor of the ROM memory cell, wherein the Flash memory cell is paired with a second Flash memory cell that share a common contact, and the manipulation of the at least one baseline mask comprises: elimination of a layout of the common contact from the at least one baseline mask, and creating a layout for a ROM memory cell contact at the location of the former floating transistor.
2. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the creation of the layout for the ROM memory cell contact comprises a modification of the at least one baseline mask for programming the ROM memory cell in accordance with a bit value of a bit in a program code, the program code, in use, providing functionality to the second semiconductor device; and the bit is arranged to be stored in the ROM memory cell.
3. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 2 , wherein the bit value has either a first bit-state or a second bit-state value; in which modification process of the at least one baseline mask, the creation of the layout for the ROM memory cell contact takes place only if the bit to be stored has one predetermined value from the first and second bit-state values.
4. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the manipulation of the at least one baseline mask comprises:
the creation of a layout for a via between two adjacent metallization-levels of the second semiconductor device, and
a modification of the at least one baseline mask for creating the layout for the via for programming the ROM memory cell in accordance with a bit value of a bit in a program code, the program code, in use, providing functionality to the second semiconductor device; and the bit is arranged to be stored in the ROM memory cell.
5. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 4 , wherein the bit value has either a first bit-state or a second bit-state value, in which modification process of the at least one baseline mask, the creation of the via takes place only if the bit to be stored has one predetermined value from the first and second bit-state values.
6. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the ROM memory cell contact comprises a contact stud.
7. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the at least one baseline mask is manipulated in such a way that at the location of the eliminated common contact a field oxide or shallow trench isolation region is defined.
8. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the Flash memory cell is paired with a second Flash memory cell that shares a common contact, and the manipulation of the at least one baseline mask comprises:
elimination of the layout of the floating transistor from the at least one baseline mask, and
creating a layout for a connection path between the common contact and the single gate transistor.
9. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 8 , wherein the creation of the layout for the connection path comprises a modification of the at least one baseline mask for programming the ROM memory cell in accordance with a bit value of a bit in a program code, the program code, in use, providing functionality to the second semiconductor device; and the bit is arranged to be stored in the ROM memory cell.
10. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 9 , wherein the bit value has either a first bit-state or a second bit-state value; in which modification process of the at least one baseline mask, the creation of the layout for the connection path takes place only if the bit to be stored has one predetermined value from the first and second bit-state values.
11. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 10 , wherein the at least one baseline mask is manipulated in such a way that if, in the modification of the at least one baseline mask, the creation of the layout for the connection path does not take place, then, at the location of the eliminated floating transistor, a field oxide or shallow trench isolation region is defined.
12. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the at least one baseline mask comprises at least one of: a mask for defining active area, a mask for defining poly-Si area, a mask for defining contact area, a mask for defining local interconnect area, and at least one mask for defining lightly doped area, on the second semiconductor device.
13. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the Flash memory cell is arranged with a periphery circuitry which is arranged between the wiring scheme and the Flash memory cell for controlling operations of the Flash memory cell, and the manipulation of the at least one baseline mask comprises a modification of the at least one baseline mask for conversion of any n-channel and p-channel devices comprised by the peripheral circuitry, into baseline CMOS n-channel and p-channel devices, respectively, the modification relating to at least one of: a layout of at least one mask for defining p-well and n-well area, a layout of a mask for defining gate oxide area, and a layout of the at least one mask for defining lightly doped area, on the second semiconductor device.
14. Method for conversion of a Flash memory cell to a ROM memory cell, in accordance with claim 1 , wherein the manufacturing of the second semiconductor device comprises lithographic processing using the at least one baseline mask.
15. Second semiconductor device comprising a ROM memory cell converted from a first semiconductor device comprising a Flash memory cell; the first and second semiconductor devices each comprising an identical device portion and an identical wiring scheme for wiring the device portion to the Flash memory cell and to the ROM memory cell, respectively, wherein the Flash memory cell has been replaced by the ROM memory cell during lithographic processing by: incorporating into a layout of at least one baseline mask a layout of the Flash memory cell, and converting the layout of the Flash memory cell in the at least one baseline mask to a layout of the ROM memory cell by eliminating, from the at least one baseline mask, a layout for the floating transistor from the layout of the Flash memory cell and designating a layout of an access transistor of the Flash memory cell as a layout of the single gate transistor of the ROM memory cell, wherein the Flash memory cell is paired with a second Flash memory cell that share a common contact, and wherein the Flash memory cell is replaced by the ROM memory cell by: elimination of a layout of the common contact from the at least one baseline mask, and creating a layout for a ROM memory cell contact at the location of the former floating transistor.
16. Computer program for carrying out calculations on the layout of the baseline masks in accordance with the method of claim 1 , wherein the computer program, after being loaded on a computer, allows the computer to carry out the following operations:
manipulating a layout of at least one baseline mask as used in the baseline technology;
the manipulation comprising:
incorporating into the layout of the at least one baseline mask a layout of a Flash memory cell, and
converting the layout of the Flash memory cell in the at least one baseline mask to a layout of a ROM memory cell by eliminating, from the at least one baseline mask, a layout for the floating transistor from the layout of the Flash memory cell and designating a layout of the access transistor of the Flash memory cell as a layout of the single gate transistor of the ROM memory cell.
17. The second semiconductor device of claim 15 , wherein the Flash memory cell is replaced by the ROM memory cell by:
the creation of a layout for a via between two adjacent metallization-levels of the second semiconductor device, and
a modification of the at least one baseline mask for creating the layout for the via for programming the ROM memory cell in accordance with a bit value of a bit in a program code, the program code, in use, providing functionality to the second semiconductor device; and the bit is arranged to be stored in the ROM memory cell.
18. The second semiconductor device of claim 15 , wherein the at least one baseline mask is manipulated in such a way that at the location of the eliminated common contact a field oxide or shallow trench isolation region is defined.
19. Method for conversion of a Flash memory cell on a first semiconductor device to a ROM memory cell on a second semiconductor device, the first and second semiconductor devices each being arranged on a semiconductor substrate and each comprising an identical device portion and an identical wiring scheme for wiring the device portion to the Flash memory cell and to the ROM memory cell, respectively;
the Flash memory cell being made in non-volatile memory technology using at least one non-volatile technology mask and comprising an access transistor and a floating transistor, the floating transistor comprising a floating gate and a control gate;
the ROM memory cell being made in a baseline technology using at least one baseline mask and comprising a single gate transistor
which method includes manipulating a layout of the at least one baseline mask;
the manipulation comprising:
incorporating into a layout of the at least one baseline mask a layout of the Flash memory cell, and
converting the layout of the Flash memory cell in the at least one baseline mask to a layout of one ROM memory cell by eliminating, from the at least one baseline mask, a layout for the floating transistor from the layout of the Flash memory cell and designating a layout of the access transistor of the Flash memory cell as a layout of the single gate transistor of the ROM memory cell, wherein the Flash memory cell is arranged with a periphery circuitry which is arranged between the wiring scheme and the Flash memory cell for controlling operations of the Flash memory cell, and the manipulation of the at least one baseline mask comprises a modification of the at least one baseline mask for conversion of any n-channel and p-channel devices comprised by the peripheral circuitry, into baseline CMOS n-channel and p-channel devices, respectively, the modification relating to at least one of: a layout of at least one mask for defining p-well and n-well area, a layout of a mask for defining gate oxide area, and a layout of the at least one mask for defining lightly doped area, on the second semiconductor device.