LASER IRRADIATION DEVICE AND METHOD OF FABRICATING OLED USING THE SAME
A laser irradiation device and a method of fabricating an OLED having an increased laser efficiency. The laser irradiation device includes: a light source to produce a laser beam; a collimation lens disposed adjacent to the light source; and an asymmetrical micro lens array disposed adjacent to the collimation lens. The method includes: providing a substrate having a first electrode; providing a donor substrate for laser transfer, including a sequentially stacked a base layer, a light-to-heat conversion layer, and a transfer layer; disposing the donor substrate on the substrate so that the transfer layer faces the substrate; and irradiating a predetermined region of the base layer using a laser irradiation device having a light source, a collimation lens, and an asymmetrical micro lens array, to transfer the transfer layer onto the substrate, and forming an organic layer pattern on the substrate.
1 . A laser irradiation device to form deposition patterns in a transfer layer, the laser irradiation device comprising:
a light source to produce a laser beam;
a collimation lens to form a collimated beam from the laser beam, disposed under the light source; and
an asymmetrical micro lens array disposed under the collimation lens.
2 . The laser irradiation device according to claim 1 , wherein the asymmetrical micro lens array is made of a set of asymmetrical micro lenses consisting of a transparent material.
3 . The laser irradiation device according to claim 1 , wherein the asymmetrical micro lens array is movable relative to the transfer layer.
4 . The laser irradiation device according to claim 1 , wherein the asymmetrical micro lens array has a focal distance of 10-300 mm.
5 . The laser irradiation device according to claim 1 , wherein the asymmetrical micro lens array comprises a plurality of lenses having widths of about 60-500 μm.
6 . The laser irradiation device according to claim 2 , wherein the transparent material comprises one of a glass and a transparent plastic.
7 . A method of fabricating an OLED, from a base substrate comprising an electrode and a donor substrate comprising a transfer layer and a light-to-heat conversion layer, the method comprising:
disposing the donor substrate on the base substrate so that the transfer layer contacts the base substrate;
using a laser irradiation device comprising an asymmetrical micro lens array, a light source and a collimation lens, to form a deposition pattern in the transfer layer, to transfer a portion of the transfer layer onto the substrate; and
separating the base substrate from the donor substrate to forming a pixel pattern on the base substrate.
8 . The method according to claim 7 , wherein the donor substrate further comprises a gas generation layer disposed between the light-to-heat conversion layer and the transfer layer.
9 . The method according to claim 7 , wherein the asymmetrical micro lens array is made of a plurality of asymmetrical micro lenses formed of a transparent material.
10 . The method according to claim 7 , wherein the asymmetrical micro lens array is movable in relation to the collimation lens and the donor substrate.
11 . The method according to claim 7 , wherein the asymmetrical micro lens array has a focal distance of about 10-300 mm.
12 . The method according to claim 9 , wherein the plurality of asymmetrical micro lenses have widths of about 60-500 μm.
13 . The method according to claim 7 , wherein the asymmetrical micro lens array is spaced apart from the donor substrate by a distance of about 20/3-200 mm.
14 . The method according to claim 7 , wherein the pixel pattern comprises pixels having widths of about 20-500/3 μm.
15 . The method according to claim 7 , wherein the laser irradiation device performs a multi-scan method.
16 . The method of claim 7 , wherein the pixel pattern comprises an organic layer.
17 . The laser irradiation device according to claim 1 , wherein the asymmetrical micro lens array divides the collimated beam into a plurality of sub-beams.
18 . The laser irradiation device according to claim 17 , wherein the sub-beams form deposition patterns in the transfer layer.