IP Library Granted Patent US 7,776,388
Granted Patent B2
US 7,776,388 · App. 11/850,165 · Granted Aug 17, 2010

Fabricating magnetic recording media on patterned seed layers

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Quick Facts
Patent No.
US 7,776,388
App. No.
11/850,165
Granted
Aug 17, 2010
Kind
B2
Abstract

Patterned media and associated methods of fabrication are provided in which vertical magnetic grains are grown on a patterned seed layer. The patterned seed layer includes a matrix of islands of a first seed material. Each island of first seed material is separated from other islands by a region of second seed material. The first seed material is selected to initiate growth of magnetic material, and the second seed material is selected to initiate growth of non-magnetic material. Subsequently, magnetic material is grown on the first seed material and non-magnetic material is grown on the second seed material. Deposition may be simultaneously. The magnetic and non-magnetic materials form well-defined vertical columns over the first and second seed materials respectively. Thus, each island behaves as an isolated magnetic unit, which switches independently from its neighbor units, which are magnetically separated by the non-magnetic material.

Claims (44)

1. A method for fabricating patterned media, the method comprising:

forming a laterally patterned seed layer comprising first and second seed materials, wherein forming the patterned seed layer comprises:

depositing a layer of the first seed material;

depositing a resist layer;

patterning the resist layer;

etching around the resist layer to remove portions of the layer of first seed material;

depositing a layer of the second seed material; and

removing the resist layer; and

simultaneously growing magnetic material on the first seed material of the patterned seed layer and non-magnetic material on the second seed material of the patterned seed layer.

2. The method of claim 1 , wherein growing the magnetic material on the first seed material and the non-magnetic material on the second seed material further comprises:

sputtering the magnetic material and the non-magnetic material, wherein the magnetic material grows on the first seed material and the non-magnetic material grows on the second seed material.

3. The method of claim 1 , wherein the first and second seed materials form a matrix of islands.

4. The method of claim 3 , wherein a top surface of the first seed material and a top surface of the second seed material are substantially planar.

5. The method of claim 1 , wherein the non-magnetic material is in an amorphous phase and the magnetic material is in a crystalline phase.

6. The method of claim 1 , wherein the magnetic material is in an amorphous phase and the non-magnetic material is in a crystalline phase.

7. A method for fabricating patterned media, the method comprising:

forming a matrix of islands from a first seed material, comprising;

depositing a layer of the first seed material;

depositing a resist layer;

patterning the resist layer; and

etching around the resist layer to remove portions of the layer of first seed material; and

forming second seed material within regions separating the matrix of islands, wherein top surfaces of the first seed material and the second seed material are substantially planar; and

growing simultaneously magnetic material on the matrix of islands of the first seed material and non-magnetic material on the second seed material.

8. The method of claim 7 , wherein growing the magnetic material on the first seed material and the non-magnetic material on the second seed material further comprises:

sputtering the magnetic material and the non-magnetic material, wherein the magnetic material grows on the first seed material and the non-magnetic material grows on the second seed material.

9. The method of claim 7 , wherein a grain size of the magnetic material corresponds to a size of the islands.

10. The method of claim 7 , wherein each of the islands comprises multiple magnetic material grains of uniform size and the magnetic material grains are aligned with a bit transition between two islands.

11. A method for fabricating patterned media, the method comprising:

forming a laterally patterned seed layer comprising first and second seed materials, wherein forming the patterned seed layer comprises:

depositing a layer of the second seed material;

depositing a resist layer;

patterning the resist layer;

etching around the resist layer to remove portions of the layer of second seed material;

depositing a layer of the first seed material; and

removing the resist layer; and

simultaneously growing magnetic material on the first seed material of the patterned seed layer and non-magnetic material on the second seed material of the patterned seed layer.

12. The method of claim 11 , wherein growing the magnetic material on the first seed material and the non-magnetic material on the second seed material further comprises:

sputtering the magnetic material and the non-magnetic material, wherein the magnetic material grows on the first seed material and the non-magnetic material grows on the second seed material.

13. The method of claim 11 , wherein the first and second seed materials form a matrix of islands.

14. The method of claim 13 , wherein a top surface of the first seed material and a top surface of the second seed material are substantially planar.

15. The method of claim 11 , wherein the non-magnetic material is in an amorphous phase and the magnetic material is in a crystalline phase

16. The method of claim 11 , wherein the magnetic material is in an amorphous phase and the non-magnetic material is in a crystalline phase.

17. The method of claim 13 , wherein a grain size of the magnetic material corresponds to a size of the islands.

18. The method of claim 13 , wherein each of the islands comprises multiple magnetic material grains of uniform size and the magnetic material grains are aligned with a bit transition between two islands.

Assignments (7)
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
RELEASE OF SECURITY INTEREST AT REEL 052915 FRAME 0566 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 059127/0001 →
SECURITY INTEREST Recorded Feb 6, 2020
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS AGENT
Reel/Frame 052915/0566 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2016
From: HGST NETHERLANDS B.V.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 040821/0550 →
CHANGE OF NAME Recorded Oct 25, 2012
From: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
To: HGST NETHERLANDS B.V.
Reel/Frame 029341/0777 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 5, 2007
From: DOBISZ, ELIZABETH; MARGULIES, DAVID; HELLWIG, OLAV; WU, XIAO Z.
To: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS, B.V.
Reel/Frame 019785/0434 →