Patterning a surface comprising silicon and carbon
View Patent ↗Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.
1. A method of patterning a surface, wherein said surface comprises at least one feature comprising silicon coupled to a substrate, comprising:
coating said surface with 3-(trimethoxysilyl)propyl methacrylate;
applying a photoresist to said 3-(trimethoxysilyl)propyl methacrylate coated surface;
imaging said photoresist;
etching said surface; and
removing said photoresist.
2. The method of patterning a surface of claim 1 further comprising at least one feature comprising carbon.
3. The method of patterning a surface of claim 1 wherein said at least one feature of silicon comprises approximately stoichiometric silicon nitride.
4. The method of patterning a surface of claim 1 wherein said photoresist comprises a liquid.
5. The method of patterning a surface of claim 1 wherein said photoresist comprises a dry film.
6. The method of patterning a surface of claim 2 wherein said at least one feature of silicon couples said at least one feature of carbon to said substrate.
7. The method of patterning a surface of claim 2 wherein said at least one feature comprising carbon comprises wear-resistant carbon.
8. A method of patterning an air bearing surface, wherein said air bearing surface comprises at least one feature having silicon and at least one feature having carbon coupled to a slider, comprising:
coating said air bearing surface with 3-(trimethoxysilyl)propyl methacrylate;
applying a photoresist to said 3-(trimethoxysilyl)propyl methacrylate coated air bearing surface;
imaging said photoresist;
etching said air bearing surface; and
removing said photoresist.
9. The method of patterning a surface of claim 8 wherein said feature of silicon couples said feature of carbon to said slider.
10. The method of patterning a surface of claim 8 wherein said feature of silicon comprises approximately stoichiometric silicon nitride.
11. The method of patterning a surface of claim 8 wherein said feature of carbon comprises wear-resistant carbon.
12. The method of patterning a surface of claim 8 wherein said photoresist comprises a liquid.
13. The method of patterning a surface of claim 8 wherein said photoresist comprises a dry film.