Field effect transistor
A field effect transistor includes: a first nitride semiconductor layer having a plane perpendicular to a (0001) plane or a plane tilted with respect to the (0001) plane as a main surface; a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a wider bandgap than the first nitride semiconductor layer; a third nitride semiconductor layer formed on the second nitride semiconductor layer; and a source electrode and a drain electrode formed so as to contact at least a part of the second nitride semiconductor layer or the third nitride semiconductor layer. A recess that exposes a part of the second nitride semiconductor layer is formed between the source electrode and the drain electrode in the third nitride semiconductor layer. A gate electrode is formed in the recess and an insulating film is formed between the third nitride semiconductor layer and the gate electrode.
1. A field effect transistor, comprising:
a first nitride semiconductor layer;
a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a wider bandgap than the first nitride semiconductor layer;
a third nitride semiconductor layer formed on the second nitride semiconductor layer, the first, second and third nitride semiconductor layers being formed on a plane perpendicular to a (0001) plane or a plane tilted with respect to the (0001) plane;
a source electrode and a drain electrode formed so as to contact at least a part of the second nitride semiconductor layer or the third nitride semiconductor layer;
a gate electrode provided between the source electrode and the drain electrode in the third nitride semiconductor layer and formed in a recess that exposes a part of the second nitride semiconductor layer; and
an insulating film formed between the third nitride semiconductor layer and the gate electrode,
wherein the insulating film is formed between the second nitride semiconductor layer and the gate electrode at the recess, and
the insulating film is made of SiN.
2. The field effect transistor according to claim 1 , wherein impurities providing n-type conductivity are doped in at least one of the second nitride semiconductor layer and the third nitride semiconductor layer.
3. The field effect transistor according to claim 1 , wherein the insulating film is formed so as to cover at least a part of each surface of the source electrode and the drain electrode.
4. The field effect transistor according to claim 1 , wherein the field effect transistor has normally-off characteristics.
5. The field effect transistor according to claim 1 , wherein the plane perpendicular to the (0001) plane or the plane tilted with respect to the (0001) plane is a (11-20) plane, a (1-100) plane, a (1-101) plane, a (1-102) plane, a (11-22) plane, or a (11-24) plane.
6. The field effect transistor according to claim 1 , wherein the first nitride semiconductor layer is made of GaN, the second nitride semiconductor layer is made of Al x Ga 1-x N (0<x<1), and the third nitride semiconductor layer is made of GaN.
7. The field effect transistor according to claim 1 , wherein the insulating film is a single-layer film of SiN.
8. The field effect transistor according to claim 1 , wherein the insulating film fully separates the gate electrode from the second nitride semiconductor layer.