Method for fabricating organic light emitting display
An exemplary method for fabricating an OLED ( 20 ) is provided. The method includes: providing an insulative substrate; forming a first electrode on the substrate, the first electrode being a conductive thin film; forming a second electrode on the first electrode, comprising providing an oxygen-containing oxidizing gas with a material used to form the second electrode; patterning the first and second electrodes to form an anode on the substrate; forming a hole injection layer on the anode; forming a hole transfer layer on the hole injection layer; forming an organic light emitting layer on the hole transfer layer; forming an electron transfer layer on the organic light emitting layer; forming an electron injection layer on the electron transfer layer; and forming a cathode on the electron injection layer.
1 . A method for fabricating an organic light emitting display (OLED), the method comprising:
providing an insulative substrate;
forming a first electrode on the substrate, the first electrode being a conductive thin film;
forming a second electrode on the first electrode, comprising providing an oxygen-containing oxidizing gas with a material used to form the second electrode;
patterning the first and second electrodes to form an anode on the substrate;
forming a hole injection layer on the anode;
forming a hole transfer layer on the hole injection layer;
forming an organic light emitting layer on the hole transfer layer;
forming an electron transfer layer on the organic light emitting layer;
forming an electron injection layer on the electron transfer layer; and
forming a cathode on the electron injection layer.
2 . The method in claim 1 , wherein the gas comprises one of oxygen, water vapor, and a mixture of oxygen and water vapor.
3 . The method in claim 1 , wherein each of the first and second electrodes is made from one of indium zinc oxide and indium tin oxide.
4 . The method in claim 1 , wherein a thickness of the first electrode is approximately equal to 1.3×10 −7 meters.
5 . The method in claim 1 , wherein a thickness of the second electrode is approximately equal to 2×10 −8 meters.
6 . The method in claim 1 , wherein the substrate is made from glass or quartz.
7 . The method in claim 1 , wherein the first electrode is formed by a sputtering method.
8 . The method in claim 1 , wherein the organic light emitting layer is made from a macromolecular electroluminescence compound.
9 . The method in claim 8 , wherein the macromolecule electroluminescence compound is poly-phenylenevinylene.
10 . The method in claim 8 , wherein the organic light emitting layer is formed by a spin-coating method or an ink jet printing method.
11 . The method in claim 1 , wherein the organic light emitting layer is made from a micromolecular electroluminescence compound.
12 . The method in claim 11 , wherein the micromolecular electroluminescence compound is diamine.
13 . The method in claim 11 , wherein the organic light emitting layer is formed by a vacuum vapor deposition method.
14 . The method in claim 1 , wherein the hole injection layer is made from copper phthalocyanine (CuPc).
15 . The method in claim 1 , wherein the hole transfer layer is made from one of polyaniline and triarylamine derivative.
16 . The method in claim 1 , wherein a thickness of the cathode is in the range from 5×10 −9 meters to 3×10 −8 meters.
17 . The method in claim 1 , wherein the cathode comprises one of a lithium/aluminum/argentine multilayer structure, a calcium/aluminum multilayer structure, and a magnesium/argentine multilayer structure.
18 . The method in claim 1 , wherein the electron transfer layer is made from an aromatic compound.
19 . The method in claim 1 , wherein the electron injection layer is made from an alkali metal, an alkali metal compound, an alkaline-earth metal, or an alkaline-earth metal compound.
20 . A method for fabricating an organic light emitting display (OLED), the method comprising:
providing an insulative substrate;
depositing transparent conductive material on the substrate;
introducing an oxygen-containing oxidizing gas into the process of depositing the transparent conductive material when the deposited transparent conductive material has reached a first predetermined thickness;
stopping the process of depositing and the providing of the gas when the deposited transparent conductive material has reached a second predetermined thickness, the second predetermined thickness being greater than the first predetermined thickness;
patterning the deposited transparent conductive material to form an anode;
forming a hole injection layer on the anode;
forming a hole transfer layer on the hole injection layer;
forming an organic light emitting layer on the hole transfer layer;
forming an electron transfer layer on the organic light emitting layer;
forming an electron injection layer on the electron transfer layer; and
forming a cathode on the electron injection layer.