IP Library Granted Patent US 7,968,370
Granted Patent B2
US 7,968,370 · App. 12/267,079 · Granted Jun 28, 2011

Semiconductor connection component

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Quick Facts
Patent No.
US 7,968,370
App. No.
12/267,079
Granted
Jun 28, 2011
Kind
B2
Abstract

There is a need for providing a technology capable of decreasing on-resistance of a power transistor in a semiconductor device that integrates the power transistor and a control integrated circuit into a single semiconductor chip. There is another need for providing a technology capable of reducing a chip size of a semiconductor device. A semiconductor chip includes a power transistor formation region to form a power transistor, a logic circuit formation region to form a logic circuit, and an analog circuit formation region to form an analog circuit. A pad is formed in the power transistor formation region. The pad and a lead are connected through a clip whose cross section is larger than that of a wire. On the other hand, a bonding pad is connected through the wire 29.

Claims (22)

1. A semiconductor device manufacturing method comprising:

(a) mounting a semiconductor chip having a first region and a second region over a lead frame having a plurality of first leads and a plurality of second leads;

(b) forming a connection material over a first bonding pad and the first lead formed in the first region;

(c) electrically connecting the first bonding pad with the first lead via a clip;

(d) applying heat treatment to the semiconductor chip; and

(e) after the step (d), electrically connecting a second bonding pad with the second lead formed in the second region via a wire.

2. The semiconductor device manufacturing method according to claim 1 ,

wherein a cross section of the clip is larger than a cross section of the wire.

3. The semiconductor device manufacturing method according to claim 1 ,

wherein an area of the first bonding pad is larger than an area of the second bonding pad.

4. The semiconductor device manufacturing method according to claim 1 ,

wherein a power transistor is formed immediately below the first bonding pad.

5. The semiconductor device manufacturing method according to claim 1 ,

wherein the connection material is selectable from solder and resin paste.

6. The semiconductor device manufacturing method according to claim 1 ,

wherein the first region is a power transistor formation region and the second region is a control integrated circuit formation region.

7. A semiconductor device manufacturing method comprising:

(a) mounting a semiconductor chip having a first region and a second region over a lead frame having a plurality of first leads and a plurality of second leads;

(b) electrically connecting a second bonding pad and the second lead formed in the second region via a wire;

(c) forming a connection material over the first bonding pad and the first lead formed over the first region after the step (b);

(d) electrically connecting the first bonding pad and the first lead via a wire; and

(e) applying heat treatment to the semiconductor chip.

Assignments (2)
CHANGE OF ADDRESS Recorded Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
MERGER AND CHANGE OF NAME Recorded Jul 29, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024755/0338 →