Display device
In a display device which includes: an insulation substrate; thin film transistors which are formed on the insulation substrate; and terminal portions which are configured to supply voltages to the thin film transistors, the thin film transistor includes a gate electrode and a gate line which is formed of a material equal to a material of the gate electrode, a metal line is connected to the terminal portion, a first insulation film and a second insulation film which is made of a material different from a material of the first insulation film are sequentially stacked on the gate line, an opening which exposes the gate line is formed in the first insulation film and the second insulation film, a side wall surface of the opening is sequentially covered with a protective film, a first transparent conductive film and a third insulation film, the first transparent conductive film and a second transparent conductive film are sequentially stacked on an exposed portion of the gate line, and the second transparent conductive film is connected with the metal line.
1 . A display device comprising:
an insulation substrate;
thin film transistors which are formed on the insulation substrate; and
terminal portions which are configured to supply voltages to the thin film transistors, wherein
the thin film transistor includes a gate electrode and a gate line which is formed of a material equal to a material of the gate electrode,
a metal line is connected to the terminal portion,
a first insulation film and a second insulation film which is made of a material different from a material of the first insulation film are sequentially stacked on the gate line,
an opening which exposes the gate line is formed in the first insulation film and the second insulation film,
a side wall surface of the opening is sequentially covered with a protective film, a first transparent conductive film and a third insulation film,
the first transparent conductive film and a second transparent conductive film are sequentially stacked on an exposed portion of the gate line, and
the second transparent conductive film is connected with the metal line.
2 . A display device according to claim 1 , wherein either one of the first insulation film and the second insulation film is formed of a silicon oxide film and another insulation film is formed of a silicon nitride film.
3 . A display device according to claim 1 , wherein the gate line is made of metal selected from a group of metals consisting of chromium, molybdenum, tungsten, titanium and an alloy containing any metal selected from the group of metals.
4 . A display device according to claim 1 , wherein the metal line is made of aluminum or an aluminum alloy containing aluminum as a main component.
5 . A display device according to claim 1 , wherein a semiconductor layer of the thin film transistor is formed of a polysilicon layer or a stacked body which is constituted of a polysilicon layer and an amorphous silicon layer formed on the polysilicon layer.
6 . A display device according to claim 1 , wherein the display device includes a counter substrate which is bonded to the insulation substrate with a predetermined gap therebetween, and a liquid crystal layer which is held in the gap,
pixel electrodes and counter electrodes which are configured to apply voltages to the liquid crystal layer are formed on the insulation substrate, and
the first transparent conductive film is formed on the same layer as the counter electrodes.
7 . A display device according to claim 1 , wherein the insulation substrate includes a display region and a peripheral region which surrounds the display region,
a drive circuit is formed on the peripheral region, and
the thin film transistor forms a constitutional element of the drive circuit.