IP Library Granted Patent US 8,739,075
Granted Patent B2
US 8,739,075 · App. 12/405,265 · Granted May 27, 2014

Method of making pattern data, and medium for storing the program for making the pattern data

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Quick Facts
Patent No.
US 8,739,075
App. No.
12/405,265
Granted
May 27, 2014
Kind
B2
Abstract

A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.

Claims (37)

1. A method of making pattern data of a pattern of a photomask from input data formed by a plurality of first cells forming a hierarchical structure, the method comprising:

converting the input data into text data;

adding, to each of the first cells, information of parent cells of the each of the first cells, the parent cells being in a higher level of the hierarchical structure than a level of the each of the first cells;

forming a first cell group from the first cell identical to one of the first cells included in same level of the hierarchical structure and the first cell placed inside one of parent cells included in a level immediately higher than a level including the first cell;

forming a second cell group from the first cells, in each level of hierarchical structure, not included in the first cell group;

forming a third cell group by excluding, from the second cell group, a first cell in the second cell group identical to an another first cell included in the first cell group;

forming a fourth cell group formed by converting pattern data representing the cells included in the third cell group to make converted pattern data representing second cells; and

replacing the first cells with the corresponding second cells in the input data to create corrected data that is used for forming the pattern of the photomask,

wherein the converted pattern data is formed by correcting the pattern data in accordance with an optical proximity effect for the patterns of the photomask ultimately formed in accordance with the corrected data, and

each of the adding, forming the first cell group, forming the second cell group, forming the third cell group and forming the fourth cell group are executed based on a comparison of the text data.

2. The method of making pattern data according to claim 1 ,

wherein, in the determination of identity between the first cell and one of the parent cells in the forming the first cell group, if the first cell is similar to the one of parent cells, the first cell is determined to be identical to the one of the parent cells.

3. The method of making pattern data according to claim 1 , further comprising:

forming a fifth cell group from the first cells included in the first cell group, and the first cell that is included in the second cell group and is identical to one of the first cells included in the first cell group.

4. The method of making pattern data according to claim 1 ,

wherein, if the first cells further include one of data of placement coordinates, data of rotation information, and data of axis inversion information, in the determination of identity between the first cell and one of the parent cells in the forming the first cell group, the one of the data of placement coordinates, the data of rotation information, and the data of axis inversion information is not used.

5. The method according to claim 1 , wherein the corrected data is stored in a non-transitory storage medium.

6. A non-transitory medium for storing a program for causing a pattern data processing system to perform a method of making pattern data for a pattern of a photomask upon receipt of input data formed by a plurality of first cells forming a hierarchical structure,

the method comprising:

converting the input data into text data;

adding, to each of the first cells, information of parent cells of the each of the first cells, the parent cells being in a higher level than a level of the each of the first cells;

forming a first cell group from the first cell identical to one of the first cells included in same level of the hierarchical structure and the first cell placed inside two or more of the parent cells included in a level immediately higher than the level including the first cell;

forming a second cell group from the first cells not included in the first cell group;

forming a third cell group by excluding a first cell in the first cell group identical to an another first cell included in the first cell group;

forming a fourth cell group formed by converting pattern data representing the cells included in the third cell group to make converted pattern data representing second cells; and

replacing the first cells with the corresponding second cells in the input data to create corrected data,

wherein the converted pattern data is formed by correcting the pattern data in accordance with an optical proximity effect for the patterns of the photomask ultimately formed in accordance with the corrected data,

wherein each of the adding, forming the first cell group, forming the second cell group, forming the third cell group and forming the fourth cell group are executed based on a comparison of the text data.

7. The non-transitory medium for storing a program for causing a pattern data processing system to perform the method of making pattern data according to claim 6 ,

wherein, in the determination of identity between the first cell and one of the parent cells in the forming the first cell group, if the first cell is similar to the one of the parent cells, the first cell is determined to be identical to the one of the parent cells.

8. The non-transitory medium for storing a program for causing a pattern data processing system to perform the method of making pattern data according to claim 6 ,

wherein, if the first cells further include one of data of placement coordinates, data of rotation information, and data of axis inversion information, in the determination of identity between the first cell and the one of the parent cells in the forming the first cell group, the one of the data of placement coordinates, the data of rotation information, and the data of axis inversion information is not used.

9. A pattern data processing system for executing the program according to claim 6 , the pattern data processing system comprising:

an interface for receiving the input data and performing data conversion on the input data;

a central processing unit for receiving the input data and executing the program;

a read-only memory for storing the program used by the central processing unit; and

a storage medium for storing the result of processing received from the central processing unit.

Assignments (3)
CHANGE OF ADDRESS Recorded Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →
CHANGE OF NAME Recorded Sep 27, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 025046/0478 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 17, 2009
From: SAITO, MUNETO; SUZUKI, KOICHI; SAKURAI, MITSUO; NAGASE, NORIMASA
To: FUJITSU MICROELECTRONICS LIMITED
Reel/Frame 022403/0791 →