IP Library Granted Patent US 8,085,116
Granted Patent B2
US 8,085,116 · App. 12/408,188 · Granted Dec 27, 2011

Elastic wave device with a dielectric layer on the comb-shaped electrodes

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Quick Facts
Patent No.
US 8,085,116
App. No.
12/408,188
Granted
Dec 27, 2011
Kind
B2
Abstract

An elastic wave device is described which includes a piezoelectric substrate, comb-shaped electrodes having teeth electrodes that are disposed so as to face each other on the piezoelectric substrate, a non-overlapping area in which the teeth electrodes of the comb-shaped electrodes do not overlap each other, and a overlapping area in which the teeth electrodes overlap each other and the velocity of sound is higher than that in the non-overlapping area.

Claims (41)

1. An elastic wave device comprising:

a piezoelectric substrate;

comb-shaped electrodes having teeth electrodes facing each other on the piezoelectric substrate;

a non-overlapping area in which the teeth electrodes of the comb-shaped electrodes do not overlap each other;

an overlapping area in which the teeth electrodes overlap each other and the velocity of sound is higher than that in the non-overlapping area; and

a dielectric layer formed on the comb-shaped electrodes, wherein the dielectric layer comprises silicon oxide (SiO 2 ), and a portion thereof that covers the non-overlapping area of the comb-shaped electrodes is larger in thickness than a portion thereof that covers the overlapping area,

wherein the dielectric layer has a portion thereof that covers the comb-shaped electrodes, wherein the portion is larger in thickness than the comb-shaped electrodes.

2. The elastic wave device according to claim 1 , wherein the comb-shaped electrodes have portions which are different in overlap width.

3. The elastic wave device according to claim 1 , wherein the electrode width in the non-overlapping area is larger than the electrode width in the overlapping area.

4. The elastic wave device according to claim 1 , wherein a film comprising a material having a sound velocity higher than that of SiO 2 film is formed on the overlapping area of the comb-shaped electrodes.

5. The elastic wave device according to claim 1 , wherein a film comprising a material having a sound velocity lower than that of SiO 2 film is formed on the non-overlapping area of the comb-shaped electrodes.

6. An elastic wave device comprising:

a piezoelectric substrate;

comb-shaped electrodes formed on the piezoelectric substrate;

a reflector adjacent to the comb-shaped electrodes, having a portion in which an overlap width of the comb-shaped electrodes varies, the comb-shaped electrodes have a non-overlapping area in which adjacent electrodes do not overlap each other and an overlapping area in which adjacent electrodes overlap each other, and wherein the reflector has an area having a sound velocity that is lower than the sound velocity of the overlapping area of the comb-shaped electrodes; and

a dielectric layer formed on the comb-shaped electrodes, wherein the dielectric layer comprises silicon oxide (SiO 2 ), and a portion thereof that covers the non-overlapping area of the comb-shaped electrodes is larger in thickness than a portion thereof that covers the overlapping area,

wherein the dielectric layer has a portion thereof that covers the comb-shaped electrodes, wherein the portion is larger in thickness than the comb-shaped electrodes.

7. The elastic wave device according to claim 6 , wherein the elastic wave device comprises a Love wave device.

8. The elastic wave device according to claim 7 , wherein the Love wave device includes a piezoelectric substrate comprising a lithium niobate (LiNbO.sub.3) substrate.

9. The elastic wave device according to claim 6 , wherein the elastic wave device comprises a boundary wave device.

10. A filter equipped with an elastic wave device comprising:

a piezoelectric substrate;

comb-shaped electrodes having teeth electrodes facing each other on the piezoelectric substrate;

a non-overlapping area in which the teeth electrodes of the comb-shaped electrodes do not overlap each other;

an overlapping area in which the teeth electrodes overlap each other and the velocity of sound is higher than in the non-overlapping area; and

a dielectric layer formed on the comb-shaped electrodes, wherein the dielectric layer comprises silicon oxide (SiO 2 ), and a portion thereof that covers the non-overlapping area of the comb-shaped electrodes is larger in thickness than a portion thereof that covers the overlapping area,

wherein the dielectric layer has a portion thereof that covers the comb-shaped electrodes, wherein the portion is larger in thickness than the comb-shaped electrodes.

11. A communication module having a filter equipped with an elastic wave device comprising:

a piezoelectric substrate;

comb-shaped electrodes having teeth electrodes facing each other on the piezoelectric substrate;

a non-overlapping area in which the teeth electrodes of the comb-shaped electrodes do not overlap each other;

an overlapping area in which the teeth electrodes overlap each other and the velocity of sound is higher than that in the non-overlapping area; and

a dielectric layer formed on the comb-shaped electrodes, wherein the dielectric layer comprises silicon oxide (SiO 2 ), and a portion thereof that covers the non-overlapping area of the comb-shaped electrodes is larger in thickness than a portion thereof that covers the overlapping area,

wherein the dielectric layer has a portion thereof that covers the comb-shaped electrodes, wherein the portion is larger in thickness than the comb-shaped electrodes.

12. A communication device including a communication module having a filter equipped with an elastic wave device comprising:

a piezoelectric substrate;

comb-shaped electrodes having teeth electrodes facing each other on the piezoelectric substrate;

a non-overlapping area in which the teeth electrodes of the comb-shaped electrodes do not overlap each other;

an overlapping area in which the teeth electrodes overlap each other and the velocity of sound is higher than in the non-overlapping area; and

a dielectric layer formed on the comb-shaped electrodes, wherein the dielectric layer comprises silicon oxide (SiO 2 ), and a portion thereof that covers the non-overlapping area of the comb-shaped electrodes is larger in thickness than a portion thereof that covers the overlapping area,

wherein the dielectric layer has a portion thereof that covers the comb-shaped electrodes, wherein the portion is larger in thickness than the comb-shaped electrodes.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2010
From: FUJITSU LIMITED
To: TAIYO YUDEN CO., LTD.
Reel/Frame 024369/0993 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 23, 2009
From: MIURA, MICHIO; WARASHINA, SUGURU; MATSUDA, TAKASHI; INOUE, SHOGO; INOUE, KAZUMORI; MATSUDA, SATORU
To: FUJITSU LIMITED
Reel/Frame 022435/0968 →