IP Library Granted Patent US 8,610,100
Granted Patent B2
US 8,610,100 · App. 12/459,339 · Granted Dec 17, 2013

Apparatus comprising nanowires

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Quick Facts
Patent No.
US 8,610,100
App. No.
12/459,339
Granted
Dec 17, 2013
Kind
B2
Abstract

A method including: a) depositing a masking material over a substrate comprising silicon; b) removing the masking material using a first process that removes the masking material in preference to silicon; c) removing silicon using a second process that removes silicon in preference to the masking material; d) continuously repeating the sequence of steps a), b) and c) to control the creation of nanowires; and e) stopping repetition of the sequence of steps a), b) and c).

Claims (25)

1. An apparatus comprising:

recessed nanowires in a silicon substrate, wherein the tops of the nanowires are at a level below the top of the substrate;

a metallic layer;

an electrolyte in contact with the recessed nanowires and the metallic layer, wherein the metallic layer, the recessed nanowires, and the electrolyte are configured to form a self-packaged battery;

wherein the recessed nanowires are formed by:

a) depositing a masking material over a substrate comprising silicon;

b) removing the masking material using a first process that removes the masking material in preference to silicon and is configured to partially remove masking material;

c) removing silicon using a second process that removes silicon in preference to the masking material;

d) repeating the sequence of steps a), b) and c) until repetition of the sequence of steps a), b) and c) is stopped;

wherein the nanowires are fabricated by further etching a recess that has been etched into the silicon substrate, wherein the nanowires and the recess are etched with the same process, and wherein the process self packages the battery.

2. An apparatus as claimed in 1 wherein the apparatus comprises a battery.

3. An apparatus comprising:

a metallic layer;

a silicon substrate comprising recessed nanowires, wherein the tops of the nanowires are at a level below the top of the substrate; and

an electrolyte contacting the recessed nanowires and the metallic layer;

wherein the metallic layer, the recessed nanowires, and the electrolyte are configured to form a self-packaged battery.

4. An apparatus as claimed in 3 wherein the metallic layer covers a recess in which the nanowires are recessed and the silicon substrate lies between the metallic layer and a further metallic layer.

5. An apparatus as claimed in claim 3 wherein the metallic layer comprises lithium and electric charge is transferred between the metallic layer and the nanowires by movement of lithium ions.

6. An apparatus as claimed in claim 5 wherein a spacing between the nanowires is decreased when the lithium ions are transferred to the nanowires and the light reflected from the nanowires changes colour.

7. An apparatus according to claim 3 , wherein the nanowires are fabricated by etching, with a chemical etchant, a silicon substrate that has been etched with a recess.

8. An apparatus according to claim 3 , wherein the nanowires and the recess are etched with the same process.

9. An apparatus according to claim 3 , wherein the nanowires are fabricated by etching, with a chemical etchant, a silicon substrate that has been etched with a recess, and wherein the nanowires and the recess are etched with the same process.

10. An apparatus according to claim 3 , wherein the recess is of a controlled depth.

11. An apparatus according to claim 3 , wherein the nanowires are separated by a controlled separation.

12. An apparatus according to claim 3 , wherein the nanowires are free from silver contamination.

Assignments (12)
PATENT SECURITY AGREEMENT Recorded Aug 6, 2024
From: RPX CORPORATION; RPX CLEARINGHOUSE LLC
To: BARINGS FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 068328/0674 →
RELEASE OF LIEN ON PATENTS Recorded Aug 5, 2024
From: BARINGS FINANCE LLC
To: RPX CORPORATION
Reel/Frame 068328/0278 →
PATENT SECURITY AGREEMENT Recorded Apr 22, 2023
From: RPX CORPORATION
To: BARINGS FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 063429/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2021
From: PROVENANCE ASSET GROUP LLC
To: RPX CORPORATION
Reel/Frame 059352/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 30, 2021
From: NOKIA US HOLDINGS INC.
To: PROVENANCE ASSET GROUP HOLDINGS LLC; PROVENANCE ASSET GROUP LLC
Reel/Frame 058363/0723 →
RELEASE OF SECURITY INTEREST Recorded Nov 30, 2021
From: CORTLAND CAPITAL MARKETS SERVICES LLC
To: PROVENANCE ASSET GROUP HOLDINGS LLC; PROVENANCE ASSET GROUP LLC
Reel/Frame 058983/0104 →
ASSIGNMENT AND ASSUMPTION AGREEMENT Recorded Feb 14, 2019
From: NOKIA USA INC.
To: NOKIA US HOLDINGS INC.
Reel/Frame 048370/0682 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 13, 2017
From: NOKIA TECHNOLOGIES OY; NOKIA SOLUTIONS AND NETWORKS BV; ALCATEL LUCENT SAS
To: PROVENANCE ASSET GROUP LLC
Reel/Frame 043877/0001 →
SECURITY INTEREST Recorded Sep 13, 2017
From: PROVENANCE ASSET GROUP HOLDINGS, LLC; PROVENANCE ASSET GROUP LLC
To: NOKIA USA INC.
Reel/Frame 043879/0001 →
SECURITY INTEREST Recorded Sep 13, 2017
From: PROVENANCE ASSET GROUP HOLDINGS, LLC; PROVENANCE ASSET GROUP, LLC
To: CORTLAND CAPITAL MARKET SERVICES, LLC
Reel/Frame 043967/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 24, 2015
From: NOKIA CORPORATION
To: NOKIA TECHNOLOGIES OY
Reel/Frame 035316/0579 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 10, 2009
From: HIRALAL, PRITESH; COLLI, ALAN
To: NOKIA CORPORATION
Reel/Frame 023081/0105 →