IP Library Granted Patent US 7,884,437
Granted Patent B2
US 7,884,437 · App. 12/481,252 · Granted Feb 8, 2011

Semiconductor device and electronic apparatus using the same

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Quick Facts
Patent No.
US 7,884,437
App. No.
12/481,252
Granted
Feb 8, 2011
Kind
B2
Abstract

A semiconductor device includes: a semiconductor substrate having an imaging region in which a plurality of photoreceptors are arranged, and a peripheral circuit region arranged around the imaging region; a plurality of microlenses formed on the imaging region; a low-refractive-index film formed on the semiconductor substrate to cover the plurality of microlenses and part of the peripheral circuit region; and a transparent substrate formed on part of the low-refractive-index film above the imaging region. A through hole is formed in part of the low-refractive-index film above an amplifier circuit arranged in the peripheral circuit region.

Claims (26)

1. A semiconductor device comprising:

a semiconductor substrate having, on a top surface of said semiconductor substrate, an imaging region in which a plurality of photoreceptors are arranged, and a peripheral circuit region arranged around the imaging region;

a plurality of microlenses formed on the imaging region;

a low-refractive-index film having a first surface and a second surface opposite to the first surface, the first surface being disposed on the semiconductor substrate to cover the plurality of microlenses and part of the peripheral circuit region; and

a transparent substrate formed on part of the second surface the low-refractive-index film above the imaging region, wherein

a through hole is formed in the low-refractive-index film above an amplifier circuit arranged in the peripheral circuit region, and is extended from the first surface to the second surface, and

the amplifier circuit is covered by an insulating layer, said insulating layer being exposed through the through hole.

2. The semiconductor device of claim 1 , wherein:

a plurality of the amplifier circuits are formed in the peripheral circuit region, and

a plurality of the through holes are formed so as to correspond to the plurality of the amplifier circuits.

3. The semiconductor device of claim 1 , wherein

a transparent adhesive layer is provided between the low-refractive-index film and the transparent substrate, and

an edge portion of the transparent adhesive layer covers the amplifier circuit and protrudes downward in the through hole to form a spherical surface.

4. The semiconductor device of claim 1 , further comprising:

a cavity member having an opening in a top surface thereof in which the semiconductor substrate is placed; and

a sealing resin formed to seal part of the semiconductor substrate outside the transparent substrate.

5. The semiconductor device of claim 1 , wherein

the sealing resin covers the amplifier circuit, and part of the sealing resin in the through hole protrudes downward to form a spherical surface.

6. The semiconductor device of claim 1 , further comprising:

an electrode formed on part of the peripheral circuit region outside the low-refractive-index film, and

the electrode is electrically connected to a thin metal wire.

7. An electronic apparatus comprising:

the semiconductor device of claim 1 ;

a mounting substrate on which a mounting electrode is formed; and

a lens formed above the transparent substrate of the semiconductor device,

wherein an electrode for external connection of the semiconductor device is disposed on the mounting electrode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 7, 2015
From: PANASONIC CORPORATION
To: PANNOVA SEMIC, LLC
Reel/Frame 036065/0273 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 23, 2009
From: MINAMIO, MASANORI; NISHIO, TETSUSHI
To: PANASONIC CORPORATION
Reel/Frame 022998/0482 →