Manufacturing method of semiconductor device
View Patent ↗A coating solution of SOG is applied on a silicon oxynitride film ( 11 ) and precured. As a result, moisture contained in the coating solution volatilizes, and an SOG film ( 12 ) is formed. Next, a coating solution of SOG is applied on the SOG film ( 12 ) and precured. As a result, an SOG film ( 13 ) is formed. Thereafter, a coating solution of SOG is applied on the SOG film ( 13 ) and precured. As a result, an SOG film ( 14 ) is formed. Subsequently, a main cure of the SOG films ( 12, 13 , and 14 ) is performed. The viscosity of the coating solution of SOG used for forming the SOG film ( 12 ) is lower than those of the coating solutions of SOG used for forming the SOG films ( 13 and 14 ).
1. A manufacturing method of a semiconductor device comprising:
forming a structure having a level difference above a semiconductor substrate;
forming a silicon oxynitride film over the structure;
applying an organic solvent including any one of ethanol, isopropyl alcohol and xylene on the silicon oxynitride film;
after applying the organic solvent, forming a first coating-type insulating film over the silicon oxynitride film with using a first coating solution; and
forming a second coating-type insulating film thicker than a height of the structure on the first coating-type insulating film with using a second coating solution whose viscosity is higher than that of the first coating solution.
2. The manufacturing method of a semiconductor device according to claim 1 , wherein, as the structure, a gate electrode is formed.
3. The manufacturing method of a semiconductor device according to claim 1 , wherein, as the structure, a wiring is formed.
4. The manufacturing method of a semiconductor device according to claim 1 , wherein the second coating-type insulating film is thicker than the first coating-type insulating film.
5. The manufacturing method of a semiconductor device according to claim 1 , wherein, as the second coating-type insulating film, an insulating film having a two-layer structure is formed.
6. The manufacturing method of a semiconductor device according to claim 1 , wherein a thickness of the first coating-type insulating film is equal to or less than 50 nm.
7. The manufacturing method of a semiconductor device according to claim 1 , further comprising forming a barrier film preventing moisture from being permeated on the second coating-type insulating film.
8. The manufacturing method of a semiconductor device according to claim 7 , wherein a thickness of the barrier film is equal to or less than 20 nm.
9. The manufacturing method of a semiconductor device according to claim 7 , wherein, as the barrier film, one selected from a group composed of an aluminum oxide film, a titanium oxide film, a zirconium oxide film, a magnesium oxide film, and a magnesium titanium oxide film is formed.
10. The manufacturing method of a semiconductor device according to claim 7 , further comprising forming an insulating film on the barrier film.
11. The manufacturing method of a semiconductor device according to claim 4 , wherein
the forming the first coating-type insulating film comprises:
applying the first coating solution; and
curing the first coating solution at a first temperature,
the forming the second coating-type insulating film comprises:
applying the second coating solution; and
curing the second coating solution at a second temperature, and
the manufacturing method further comprising, after the forming the second coating-type insulating film, curing the first and second coating-type insulating films at a third temperature higher than the first and second temperatures.
12. The manufacturing method of a semiconductor device according to claim 11 , wherein, in the forming the second coating-type insulating film, the applying the second coating solution and the curing the second coating solution at a second temperature are repeated two times.
13. The manufacturing method of a semiconductor device according to claim 1 , wherein, as the first and second coating solutions, a coating solution of spin on glass is used.
14. The manufacturing method of a semiconductor device according to claim 11 , wherein moisture contained in the first coating solution is volatilized by the curing the first coating solution.
15. The manufacturing method of a semiconductor device according to claim 11 , wherein the first temperature is 100° C. to 200° C.
16. The manufacturing method of a semiconductor device according to claim 11 , wherein a time for the curing the first coating solution is for one minute to three minutes.
17. The manufacturing method of a semiconductor device according to claim 11 , wherein the curing the first coating solution is performed in an inert gas atmosphere.
18. The manufacturing method of a semiconductor device according to claim 1 , wherein a viscosity of the first coating solution is a viscosity in which a coating film whose thickness is 10 nm to 50 nm is allowed to be obtained in a case when the first coating solution is supplied to a coater while spinning the coater at a speed of 2000 rpm to 4000 rpm.
19. The manufacturing method of a semiconductor device according to claim 5 , wherein in the forming the second coating-type insulating film, the applying the second coating solution is performed two times.
20. The manufacturing method of a semiconductor device according to claim 5 , wherein each layer of the insulating film having the two-layer structure is thicker than the first coating-type insulating film.