Method of producing an acoustic wave device
A method of producing an acoustic wave device includes: forming an interdigital electrode on a piezoelectric substrate; forming a barrier film so as to cover the interdigital electrode; forming a medium on the barrier film; measuring a frequency characteristic of an acoustic wave excited by the interdigital electrode; and forming, in an excitation region, an adjustment region having a thickness different from other portions by patterning the barrier film or further providing an adjustment film. When forming the adjustment region, an area T of the adjusting area is adjusted in accordance with the measured frequency characteristic.
1. A method of producing an acoustic wave device, comprising:
forming an interdigital transducer having a pair of comb-shaped electrodes on a piezoelectric substrate;
forming a barrier film so as to cover the interdigital transducer;
forming a medium on the barrier film;
measuring a frequency characteristic of an acoustic wave excited by the interdigital transducer;
forming, within an excitation region directly over the pair of comb-shaped electrodes where the acoustic wave is excited by the pair of comb-shaped electrodes, an adjustment region having a surface area T as viewed from a top view and a thickness different from other portions of the excitation region in the same layer of the barrier film by patterning the barrier film or further providing an adjustment film; and
adjusting a frequency characteristics of the acoustic wave by adjusting the surface area T of the adjustment region when forming the adjustment region.
2. The method of producing an acoustic wave device according to claim 1 , wherein
when forming the interdigital transducer, interdigital transducers corresponding to a plurality of acoustic wave devices are formed on the piezoelectric substrate,
when measuring the frequency characteristic, a distribution of a frequency characteristic of the plurality of acoustic wave devices is measured, and
when forming the adjustment region, the adjustment region is such that the surface area T varies in accordance with the frequency characteristic distribution of the plurality of acoustic wave devices.
3. The method of producing an acoustic wave device according to claim 1 , wherein
when measuring the frequency characteristic, a frequency characteristic of each acoustic wave device on the piezoelectric substrate is measured, and
when forming the adjustment region, the surface area T of the adjustment region is determined on the basis of a difference between the measured frequency characteristic of the acoustic wave device and a predetermined reference frequency characteristic.
4. The method of producing an acoustic wave device according to claim 1 , wherein the step of adjusting includes adjusting the surface area T of the adjustment region without adjusting the thickness of the adjustment region.
5. The method of producing an acoustic wave device according to claim 4 , wherein the step of adjusting includes adjusting the ratio of the surface area T of the adjustment region relative to a surface area of the excitation region.
6. The method of producing an acoustic wave device according to claim 1 , wherein the step of adjusting includes adjusting the ratio of the surface area T of the adjustment region relative to a surface area of the excitation region.
7. The method of producing an acoustic wave device according to claim 1 , wherein in the step of adjusting the frequency characteristics of the acoustic wave, the surface area T of the adjustment region is adjusted without changing the thickness of the adjustment region.