Load chamber with heater for a disk sputtering system
View Patent ↗A disk processing system having a plurality of processing chambers, a load chamber comprising a heater, and a disk transport system coupled to the plurality of processing chambers and the load chamber to transport a disk there among.
1. A disk processing system, comprising:
a plurality of processing chambers;
a load chamber comprising a heater, wherein the load chamber has a side wall, wherein the heater is disposed adjacent to the side wall inside of the load chamber, and wherein the heater comprises a heating element having a thickness being less than 1 inch and capable of being electrically coupled to a power supply to provide a power great than 1.1 K Watts to heat a disk within the load chamber; and
a disk transport system coupled to the plurality of processing chambers and the load chamber to transport the disk there among.
2. The system of claim 1 , wherein the load chamber further comprises a cooling assembly.
3. The system of claim 2 , wherein the cooling assembly comprises cooling passages disposed within a cover of the load chamber.
4. The system of claim 1 , wherein the heater comprises a pyrolytic boron nitride heating element.
5. The system of claim 1 , wherein the heater comprises an infrared heating element.
6. The system of claim 1 , wherein the load chamber further comprises a load arm assembly comprising:
a load arm;
a wrist block coupled to the load arm; and
a plurality of disk contact points coupled to the wrist block.
7. The system of claim 6 , wherein the wrist block and the load are constructed from a material comprising at least one of titanium and nickel steel alloy.
8. The system of claim 6 , wherein the disk contact points are constructed from a material comprising stainless steel.
9. The system of claim 6 , wherein the disk contact points are constructed from a material comprising ceramic.
10. The system of claim 1 , wherein the load chamber further comprises:
a cover;
a load arm assembly; and
a disk presence sensor coupled to the cover of the load chamber and oriented towards a side edge of the disk when the disk is secured in the load arm.
11. The system of claim 1 , wherein one of the plurality of process chambers comprises a heat chamber.
12. The system of claim 1 , wherein the load chamber is further an unload chamber.
13. The system of claim 1 , wherein the heater is coupled inside the load chamber using an attachment assembly comprising a bracket and a plurality of holders.
14. The system of claim 13 , wherein the bracket is constructed from a material comprising titanium.
15. The system of claim 1 , wherein one of the plurality of process chambers comprises a grain isolation sputter chamber.
16. The system of claim 1 , wherein the plurality of processing chambers comprises 12 process chambers, and wherein none of the 12 process chambers comprise a heater.
17. The system of claim 1 , wherein the load chamber has only a single heater.
18. The system of claim 1 , where the power is approximately 2.5 K Watts.