Semiconductor device and method of manufacturing the same
View Patent ↗There is provided a semiconductor device which comprises a first interlayer insulating film (first insulating film) formed over a silicon (semiconductor) substrate, a capacitor formed on the first interlayer insulating film and having a lower electrode, a dielectric film, and an upper electrode, a fourth interlayer insulating film (second insulating film) formed over the capacitor and the first interlayer insulating film, and a metal pattern formed on the fourth interlayer insulating film over the capacitor and its periphery to have a stress in an opposite direction to the fourth interlayer insulating film. As a result, characteristics of the capacitor covered with the interlayer insulating film can be improved.
1. A manufacturing method of semiconductor device comprising:
forming a first insulating film over a semiconductor substrate;
forming capacitors, each having a lower electrode, a dielectric film, and an upper electrode, on the first insulating film in a cell region;
forming a second insulating film over the capacitor and the first insulating film;
forming a recess, which covers the cell region, in the second insulating film;
forming a metal film, which has a thickness of burying the recess, in the recess and on an upper surface of the second insulating film;
removing the metal film from the upper surface of the second insulating film and also leaving the metal film in the recess as a metal pattern; and
heating the metal film at a melting point or less of the metal film before or after the formation of the metal pattern, to change a stress of the metal film.
2. A method according to claim 1 , wherein the second insulating film is formed of a laminated film consisting of a plurality of insulating films, and at least one layer of the laminated film is a film that is formed by using a reaction gas containing TEOS.