Biosensor, thin film electrode forming method, quantification apparatus, and quantification method
View Patent ↗A biosensor is disclosed comprising a support; a conductive layer composed of an electrical conductive material such as a noble metal, for example gold or palladium, and carbon; slits parallel to and perpendicular to the side of the support; working, counter, and detecting electrodes; a spacer which covers the working, counter, and detecting electrodes on the support; a rectangular cutout in the spacer forming a specimen supply path; an inlet to the specimen supply path; a reagent layer formed by applying a reagent containing an enzyme to the working, counter, and detecting electrodes, which are exposed through the cutout in the spacer; and a cover over the spacer. The biosensor can be formed by a simple method, and provides a uniform reagent layer on the electrodes regardless of the reagent composition.
1. A method of manufacturing a biosensor comprising the steps of:
roughening the surface of an insulating support by exposing the surface of the insulating support to an excited gas in a vacuum chamber,
forming a thin film electrode layer on the roughened surface of the insulating support, wherein the thin film electrode layer has a roughened surface that reflects the roughened surface of the underlying insulating support; and
forming a reagent layer on the thin film electrode layer.
2. The method of manufacturing a biosensor of claim 1 , wherein the thin film electrode layer comprises a conductive substance selected from the group consisting of noble metal and carbon.
3. The method of manufacturing a biosensor of claim 2 , wherein the thin film electrode layer has a thickness from 3 nm to 100 nm.
4. The method of manufacturing a biosensor of claim 3 , wherein the reagent layer comprises an electron carrier.
5. The method of manufacturing a biosensor of claim 2 , wherein the reagent layer comprises an electron carrier.
6. The method of manufacturing a biosensor of claim 1 , wherein the thin film electrode layer has a thickness from 3 nm to 100 nm.
7. The method of manufacturing a biosensor of claim 6 , wherein the reagent layer comprises an electron carrier.
8. The method of manufacturing a biosensor of claim 1 , wherein the reagent layer comprises an electron carrier.
9. The method of manufacturing a biosensor of claim 1 , wherein the roughening step comprises colliding the excited gas against the surface of the insulating support.
10. A method of manufacturing a biosensor, comprising the steps of:
roughening a surface of an insulating support;
forming an electrode on the roughened surface of the insulating support, wherein the electrode has a roughened surface that reflects the roughened surface of the underlying insulating support; and
forming a reagent layer on the electrode.
11. The method of manufacturing a biosensor of claim 10 , wherein the reagent layer is on the electrode and on at least a portion of the insulating support.
12. The method of manufacturing a biosensor of claim 10 , wherein the surface of the insulating support is roughened by exposing the surface to an excited gas.
13. A method of manufacturing a biosensor, comprising the steps of:
placing an insulating support in a vacuum chamber which is filled with inert gas and applying a voltage thereto;
forming an electrode on a surface of the insulating support, wherein the electrode has a surface that reflects the surface of the underlying insulating support; and
forming a reagent layer on the electrode.
14. The method of manufacturing a biosensor of claim 13 , wherein the inert gas is selected from the group consisting of argon, neon, helium, krypton, xenon and nitrogen.