IP Library Granted Patent US 8,928,044
Granted Patent B2
US 8,928,044 · App. 12/984,767 · Granted Jan 6, 2015

Display device, switching circuit and field effect transistor

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Quick Facts
Patent No.
US 8,928,044
App. No.
12/984,767
Granted
Jan 6, 2015
Kind
B2
Abstract

A this film transistor is provided. The thin film transistor includes a semiconductor layer including a source region, a drain region, and a channel region, wherein the channel region is provided between the source region and the drain region; and a gate electrode overlapping with the channel region, wherein the channel region includes at least a portion of a channel width that is configured to at least one of continuously decrease and continuously increase in a lengthwise direction.

Claims (9)

1. A thin film transistor comprising:

a semiconductor layer including a source region, a drain region, and at least two channel regions provided between the source region and the drain region; and

at least two gate electrodes overlapping with the channel regions, for applying gate voltage to the at least two channel regions,

wherein the channel regions include a first portion whose width continuously linearly changes along a lengthwise direction from the source region to the drain region, and a second portion whose width is constant,

wherein the first portion and the second portion are linearly connected in a direction from the source region to the drain region, and

wherein the semiconductor layer between the at least two channel regions has at least two portions each having a different width.

2. The thin film transistor of claim 1 , wherein the channel width includes a source channel width portion directed to the source region and a drain channel width portion directed to the drain region, and wherein the source channel width portion is greater in size as compared to the drain channel width portion.

3. The thin film transistor of claim 1 , wherein the channel width includes a source channel width portion directed to the source region and a drain channel width portion directed to the drain region, and wherein the source channel width portion is lesser in size as compared to the drain channel width portion.

4. The thin film transistor of claim 1 , wherein the channel width includes a source channel width portion directed to the source region and a drain channel width portion directed to the drain region, and wherein the source channel width portion and the drain channel width portion are equal in size.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 9, 2013
From: SONY CORPORATION
To: JAPAN DISPLAY WEST INC.
Reel/Frame 030182/0522 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 25, 2011
From: OZEKI, YOSHITAKA; KUWAHARA, YASUHITO; TORIYAMA, SHIGETAKA; IKEDA, HIROYUKI
To: SONY CORPORATION
Reel/Frame 025863/0740 →