Removing residues in magnetic head fabrication
The present invention generally relates to a method of forming a magnetic head while ensuring residues do not negatively impact the magnetic head. In particular, when performing a RIE process to remove DLC, oxygen gas can leave residues that will negatively impact the RIE process performed on the next substrate to enter the chamber. By utilizing CO 2 rather than O 2 , the residues will not be created and therefore will not impact processing of the next substrate that enters the chamber.
1. A method for making a magnetic write pole head, comprising:
forming a main pole trench in a substrate having a hardmask thereover;
depositing a ruthenium layer within the trench and over the hardmask;
depositing magnetic material over at least part of the ruthenium layer and at least partially filling the trench with the magnetic material;
removing selected portions of the magnetic material to expose the ruthenium layer;
depositing a diamond like carbon layer over the exposed ruthenium layer;
performing a chemical mechanical polishing process to remove at least a portion of the magnetic material; and
reactive ion etching the diamond like carbon layer with CO 2 to remove the diamond like carbon layer.
2. The method of claim 1 , wherein the reactive ion etching is performed at a chamber pressure of between about 8 mTorr to about 40 mTorr.
3. The method of claim 2 , wherein the reactive ion etching is performed while biasing the substrate at a power range of between about 30 watts to about 60 watts.
4. The method of claim 3 , wherein the reactive ion etching is performed while applying a source power of between about 200 watts to about 400 watts.
5. The method of claim 4 , wherein the reactive ion etching is additionally performed with an inert gas and N 2 gas.
6. The method of claim 5 , wherein the inert gas comprises helium.
7. The method of claim 6 , further comprising ion milling the ruthenium and hardmask NiCr or Cr.
8. The method of claim 7 , wherein the magnetic material comprises NiFe or CoNiFe.
9. A method for making a magnetic write pole head, comprising:
forming a main pole trench in a substrate having a hardmask thereover;
depositing a ruthenium layer within the trench and over the hardmask;
depositing magnetic material over the ruthenium layer and filling the trench with the magnetic material;
removing selected portions of the magnetic material to expose the ruthenium layer;
depositing a diamond like carbon layer over the exposed ruthenium layer;
performing a chemical mechanical polishing process to remove portions of the magnetic material; and
reactive ion etching the diamond like carbon layer with CO 2 to remove the diamond like carbon layer, wherein the reactive ion etching is performed while biasing the substrate at a power range of between about 30 watts to about 60 watts and while applying a source power of between about 200 watts to about 400 watts.
10. The method of claim 9 , wherein the reactive ion etching is additionally performed with an inert gas or with addition of N 2 gas.
11. The method of claim 10 , wherein the inert gas comprises helium.
12. The method of claim 11 , further comprising ion milling the ruthenium and hardmask NiCr or Cr.
13. The method of claim 12 , wherein the magnetic material comprises NiFe or CoNiFe.
14. A method for making a magnetic write pole head, comprising:
forming a NiCr reactive ion etching stop layer over a substrate;
forming an alumina layer over the reactive ion etching stop layer;
forming a hardmask over a portion of the alumina layer;
reactive ion etching exposed alumina to form a main pole trench in the alumina layer and expose the reactive ion etching stop layer;
depositing a ruthenium layer within the trench, over the hardmask and over the exposed reactive ion etching stop layer;
depositing NiFe or CoFeNi magnetic material over the ruthenium layer and filling the trench with the magnetic material;
removing selected portions of the magnetic material to expose the ruthenium layer;
depositing a diamond like carbon layer over the exposed ruthenium layer;
performing a chemical mechanical polishing process to remove portions of the magnetic material; and
reactive ion etching the diamond like carbon layer with CO 2 to remove the diamond like carbon layer.
15. The method of claim 14 , wherein the reactive ion etching of the diamond like carbon layer is performed at a chamber pressure of between about 8 mTorr to about 40 mTorr.
16. The method of claim 15 , wherein the reactive ion etching of the diamond like carbon layer is performed while biasing the substrate at a power range of between about 30 watts to about 60 watts.
17. The method of claim 16 , wherein the reactive ion etching of the diamond like carbon layer is performed while applying a bias of between about 200 watts to about 400 watts.
18. The method of claim 17 , wherein the reactive ion etching of the diamond like carbon layer is additionally performed with an inert gas or addition of N 2 gas.
19. The method of claim 18 , wherein the inert gas comprises helium.
20. The method of claim 19 , further comprising ion milling the ruthenium.