Semiconductor device with a plurality of dot patterns and a line pattern having a projection part
View Patent ↗A semiconductor device includes a first pattern and a plurality of second patterns arranged at equal intervals. When the distance of the space between the first pattern and the second pattern closet to the first pattern is larger than a first distance, a plurality of dummy patterns are arranged in the space with shapes and intervals similar to those of the second patterns. When the distance of the space is equal to or less than the first distance and larger than a second distance, the dummy pattern is spaced from the second pattern closest to the first pattern, and extends toward the first pattern to be brought into contact with the first pattern. When the distance of the space is equal to or less than the second distance, the dummy pattern is spaced from the second pattern closest to the first pattern, and is connected to the first pattern.
1. A semiconductor device comprising:
a line pattern extending in a first direction;
a plurality of dot patterns formed in line at equal intervals in a second direction, the second direction intersecting the first direction; and
a projection part projected from an end of the line pattern toward the dot patterns in the second direction, the projection part being in a same layer of the semiconductor device as the line pattern and the plurality of dot patterns.
2. The semiconductor device according to claim 1 , wherein a width of the projection part in the first direction is substantially equal to that of the dot pattern in the first direction.
3. The semiconductor device according to claim 1 , wherein an interval between the dot patterns adjacent to each other in the second direction is substantially equal to that between the projection part and the dot pattern closest to the projection part in the second direction.
4. The semiconductor device according to claim 1 , wherein the projection part and a row of the dot patterns closest to the projection part are substantially in line in the second direction.
5. The semiconductor device according to claim 1 , wherein a center position between two of the projection part that are adjacent to each other in the first direction and a row of the dot patterns closest to the center position are substantially in line in the second direction.
6. The semiconductor device according to claim 1 , wherein a plurality of rows, each of which includes a plurality of the dot patterns arranged in the second direction, are arranged at equal intervals in the first direction.
7. The semiconductor device according to claim 6 , wherein the plurality of rows that are adjacent to each other in the first direction are arranged with a half pitch shift in the second direction.
8. A semiconductor device comprising:
a first line pattern extending in a first direction;
a plurality of first dot patterns in line at equal intervals in a second direction intersecting the first direction;
a second line pattern extending in the second direction;
a plurality of second dot patterns in line at equal intervals in the first direction; and
a projecting part projecting in the first direction from the second line pattern toward the second dot patterns,
wherein
the first line pattern is longer in the first direction than the second direction,
the second line pattern is longer in the second direction than the first direction,
the first dot patterns are shorter in the first direction than the first line pattern, and
the second dot patterns are shorter in the second direction than the second line pattern.
9. The semiconductor device according to claim 8 , wherein an end of the first line pattern and an end of the second line pattern contact each other.