Easy axis hard bias structure
In one embodiment, a magnetic head includes a sensor stack of thin films including a free layer; a hard bias structure comprising a first foundation layer, a second foundation layer formed on the first foundation layer and a hard bias layer formed above the second foundation layer, wherein portions of the first and second foundation layers positioned along a side wall of the sensor stack have a discrete island structure. Additional embodiments are also disclosed.
1. A magnetic head, comprising:
a sensor stack of thin films including a free layer;
a hard bias structure comprising a first foundation layer, a second foundation layer formed on the first foundation layer and a hard bias layer formed above the second foundation layer,
wherein portions of the first and second foundation layers positioned along a side wall of the sensor stack have a discrete island structure, wherein a film thickness of the portion of the first foundation layer is not less than 0.1 nm,
wherein the discrete island structure is sandwiched between the hard bias layer and the side wall of the sensor stack.
2. The magnetic head as recited in claim 1 , wherein a horizontal portion of the second foundation layer is continuous.
3. The magnetic head as recited in claim 1 , wherein the portion of the first foundation layer positioned along the side of the sensor stack is a growth nucleus for the second foundation layer.
4. The magnetic head as recited in claim 1 , wherein a gap is present between the discrete island structure and horizontal portions of the first and second foundation layers.
5. The magnetic head as recited in claim 1 , further comprising an insulating layer extending along the side wall of the sensor stack, wherein the sensor stack includes a tunnel barrier layer.
6. The magnetic head as recited in claim 1 , wherein a film thickness of the first foundation layer at the position along the side wall of the sensor stack is not greater than 0.2 nm.
7. The magnetic head as recited in claim 6 , wherein the film thickness is not less than 0.1 nm.
8. The magnetic head as recited in claim 1 , wherein
the first foundation layer includes a material selected from a group consisting of NiTa, CrMo, CoCrPt, Cr and NiFe.
9. The magnetic head as recited in claim 1 ,
wherein an easy axis of magnetization of an end portion of the hard bias layer positioned closest to the sensor stack is oriented in about a direction of magnetization of the free layer.
10. A magnetic data storage system, comprising:
at least one magnetic head as recited in claim 1 ;
a magnetic medium;
a drive mechanism for passing the magnetic medium over the at least one magnetic head; and
a controller electrically coupled to the at least one magnetic head for controlling operation of the at least one magnetic head.
11. A magnetic head, comprising:
a sensor stack of thin films including a free layer and a tunnel barrier layer;
an insulating layer extending along a side wall of the sensor stack;
a hard bias structure comprising a first foundation layer, a second foundation layer formed on the first foundation layer and a hard bias layer formed above the second foundation layer,
wherein portions of the first and second foundation layers positioned along the side wall of the sensor stack have a discrete island structure, wherein a film thickness of the portion of the first foundation layer is not less than 0.1 nm,
wherein a gap is present between the discrete island structure and horizontal portions of the first and second foundation layers,
wherein the discrete island structure is sandwiched between the hard bias layer and the side wall of the sensor stack.
12. The magnetic head as recited in claim 11 ,
wherein the portion of the first foundation layer positioned along the side of the sensor stack is a growth nucleus for the second foundation layer.
13. The magnetic head as recited in claim 11 ,
wherein a film thickness of the first foundation layer at the position along the side wall of the sensor stack is not greater than 0.2 nm and not less than 0.1 nm.
14. The magnetic head as recited in claim 11 , wherein the first foundation layer includes a material selected from a group consisting of NiTa, CrMo, CoCrPt, Cr and NiFe.
15. The magnetic head as recited in claim 11 , wherein an easy axis of magnetization of an end portion of the hard bias layer positioned closest to the sensor stack is oriented in about a direction of magnetization of the free layer.
16. A magnetic data storage system, comprising:
at least one magnetic head as recited in claim 11 ;
a magnetic medium;
a drive mechanism for passing the magnetic medium over the at least one magnetic head; and
a controller electrically coupled to the at least one magnetic head for controlling operation of the at least one magnetic head.
17. A method for forming a magnetic head, comprising:
forming a sensor stack of thin films above a substrate;
forming a first foundation layer above the substrate and along a side wall of the sensor stack such that a portion of the first foundation layer along the side wall of the sensor stack is a discrete island;
forming a second foundation layer on the first foundation layer such that portions of the first and second foundation layers positioned along a side wall of the sensor stack have a discrete island structure; wherein a film thickness of the portion of the first foundation layer is not less than 0.1 nm and
forming a hard bias layer above the second foundation layer, the discrete island structure being positioned between the hard bias layer and the sensor stack.
18. The method as recited in claim 17 , wherein the portion of the first foundation layer positioned along the side of the sensor stack is a growth nucleus for the second foundation layer.
19. The method as recited in claim 17 , wherein a gap is present between the discrete island structure and horizontal portions of the first and second foundation layers.
20. The method as recited in claim 17 , further comprising forming an insulating layer along the side wall of the sensor stack prior to forming the first foundation layer, wherein the sensor stack includes a tunnel barrier layer.
21. The method as recited in claim 17 , wherein a film thickness of the first foundation layer at the position along the side wall of the sensor stack is not greater than 0.2 nm.
22. The method as recited in claim 21 , wherein the film thickness is not less than 0.1 nm.
23. The method as recited in claim 17 , wherein the first foundation layer includes a material selected from a group consisting of NiTa, CrMo, CoCrPt, Cr and NiFe.
24. The method as recited in claim 17 , wherein an easy axis of magnetization of an end portion of the hard bias layer positioned closest to the sensor stack is oriented in about a direction of magnetization of the free layer.