Semiconductor device and process for producing semiconductor device
View Patent ↗A semiconductor device includes: a substrate in which a product region and scribe regions are defined; a 1st insulation film formed above the substrate; a metal film in the 1st insulation film, disposed within the scribe regions in such a manner as to surround the product region; a 2nd insulation film formed on the 1st insulation film and the metal film; a 1st groove disposed more inside than the metal film in such a manner as to surround the product region, and reaching from a top surface of the 2nd insulation film to a position deeper than a top surface of the metal film; and a 2nd groove disposed more outside than the metal film in such a manner as to surround the metal film, and reaching from the top surface of the 2nd insulation film to a position deeper than the top surface of the metal film.
1. A semiconductor device comprising:
a substrate that includes a product region and a scribe region surrounding the product region;
a 1st insulation film formed above the substrate;
a 1st metal film, that is located in the scribe region of the substrate and surronds the product region of the substrate on a plan view parallel to the substrate, formed in the 1st insulation film;
a 2nd insulation film formed on the 1st insulation film and the 1st metal film;
a 1st groove, that surrounds the product region of the substrate and is surrounded by the 1st metal film on a plan view and that includes a 1st bottom located lower than a top surface of the 1st metal film, formed in the 2nd insulation film and at least part of the 1st insulation film; and
a 2nd groove, that surrounds the 1st metal film on a plan view and that includes a 2nd bottom located lower than the top surface of the 1st metal film, formed in the 2nd insulation film and at least part of the 1st insulation film.
2. The semiconductor device according to claim 1 , further comprising:
multiple wiring layers disposed between the substrate and the 1st insulation film; and
conductive members, that surround the product region of the substrate on a plan view and that is connected to the substrate and the 1st metal film, disposed in the multiple wiring layers.
3. The semiconductor device according to claim 1 , further comprising a 3rd metal film, that is located in the scribe region of the substrate and surrounds the 2nd groove on a plan view parallel to the substrate, formed in the 1st insulation film.
4. The semiconductor device according to claim 3 , further comprising a 3rd groove, that surrounds the 3rd metal film on a plan view parallel to the substrate and that includes a 3rd bottom located lower than a top surface of a 3rd metal film, formed in the 2nd insulation film and at least part of the 1st insulation film.
5. The semiconductor device according to claim 4 , further comprising a 4th groove, that surrounds the 2nd groove and is surrounded by the 3rd metal film on a plan view and that includes a 4th bottom located lower than a top surface of the 3rd metal film, formed in the 2nd insulation film and at least part of the 1st insulation film.
6. The semiconductor device according to claim 1 , further comprising a 2nd metal film, that surrounds the 1st groove and is surrounded by the 2nd groove on a plan view and that includes a material different from a material of the 1st metal film, formed on the 1st insulation film.