IP Library Granted Patent US 8,982,632
Granted Patent B2
US 8,982,632 · App. 13/777,529 · Granted Mar 17, 2015

Semiconductor memory device and method of driving semiconductor memory device

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Quick Facts
Patent No.
US 8,982,632
App. No.
13/777,529
Granted
Mar 17, 2015
Kind
B2
Abstract

Upon programming a semiconductor memory device including a first and a second n-wells, a first and a second p-channel memory transistors respectively formed in the first and the second n-wells, and a bit line connected to a drain of the first p-channel transistor and a drain of the second p-channel memory transistor, a first voltage is applied to the first bit line, a second voltage is applied to the first n-well, and a third voltage lower than the second voltage is applied to the second n-well.

Claims (49)

1. A semiconductor memory device comprising:

a semiconductor substrate that includes a first memory array region;

a first n-well formed in the first memory array region of the semiconductor substrate;

a second n-well, that is adjacent to the first n-well, formed in the first memory array region of the semiconductor substrate and electrically isolated from the first n-well;

a first p-channel memory transistor, that includes a first drain, formed in the first n-well;

a second p-channel memory transistor, that includes a second drain, formed in the second n- well;

a first bit line select circuit;

a first word line connected to a control gate of the first p-channel memory transistor;

a second word line connected to a control gate of the second p-channel memory transistor;

a first bit line, that is connected to the first bit line select circuit, connected to the first drain and the second drain; and

a control circuit that, upon programming in the first p-channel memory transistor, applies a first voltage to the first bit line, a second voltage to the first n-well and a third voltage lower than the second voltage to the second n-well.

2. The semiconductor memory device according to claim 1 , wherein

a potential difference between the first voltage and the third voltage is not more than 3 V.

3. The semiconductor memory device according to claim 1 , further comprising:

a third p-channel memory transistor, that includes a third drain connected to the first bit line, formed in the first n-well; and

a third word line connected to a control gate of the third p-channel memory transistor,

wherein the control circuit applies, upon programming in the first p-channel memory transistor, a fourth voltage lower than the second voltage to the third word line.

4. The semiconductor memory device according to claim 1 , wherein

the control circuit applies, upon programming in the first p-channel memory transistor, a fifth voltage that turns off the second p-channel memory transistor to the second word line.

5. The semiconductor memory device according to claim 1 , further comprising:

a fourth p-channel memory transistor, that includes a control gate connected to the first word line and that includes a fourth drain, formed in the first n-well; and

a second bit line connected to the fourth drain,

wherein the control circuit applies, upon programming in the first p-channel memory transistor, a sixth voltage higher than the first voltage to the second bit line.

6. The semiconductor memory device according to claim 5 , wherein

a potential difference between the second voltage and the sixth voltage is not more than 3 V.

7. The semiconductor memory device according to claim 1 , wherein

the control device, upon programming in the first p-channel memory transistor, applies a seventh voltage to the first word line, generates electrons by band-to-band tunneling caused by an application of the first voltage and the seventh voltage and accelerates the electrons by a potential difference between the first voltage and the second voltage to inject the electrons into a charge storage layer of the first p-channel memory transistor.

8. A method of driving a semiconductor memory device that includes a first n-well formed in a first memory region of a semiconductor substrate, a second n-well formed in the first memory region of the semiconductor substrate and electrically isolated from the first n-well and located adjacent to the first n-well, a first bit line select circuit, a first p-channel memory transistor formed in the first n-well, a second p-channel memory transistor formed in the second n-well, a first word line connected to a control gate of the first p-channel memory transistor, a second word line connected to a control gate of the second p-channel memory transistor, and a first bit line connected to the first bit line select circuit and connected to a first drain of the first p-channel transistor and a second drain of the second p-channel memory transistor, comprising:

upon programming the first p-channel memory transistor, a first voltage being applied to the first bit line, a second voltage being applied to the first n-well, and a third voltage lower than the second voltage being applied to the second n-well.

9. The method of driving a semiconductor memory device according to claim 8 , wherein

a potential difference between the first voltage and the third voltage is not more than 3 V.

10. The method of driving a semiconductor memory device according to claim 8 , wherein

the semiconductor memory device further includes

a third p-channel memory transistor, that includes a third drain connected to the first bit line, formed in the first n-well, and

a third word line connected to a control gate of the third p-channel memory transistor,

upon programming in the first p-channel memory transistor, a fourth voltage lower than the second voltage is applied to the third word line.

11. The method of driving a semiconductor memory device according to claim 8 , wherein

upon programming in the first p-channel memory transistor, a fifth voltage that turns off the second p-channel memory transistor is applied to the second word line.

12. The method of driving a semiconductor memory device according to claim 8 , wherein

the semiconductor memory device further includes

a fourth p-channel memory transistor, that includes a control gate connected to the first word line and that includes a fourth drain, formed in the first n-well, and

a second bit line connected to the fourth drain,

upon programming in the first p-channel memory transistor, a sixth voltage higher than the first voltage is applied to the second bit line.

13. The method of driving a semiconductor memory device according to claim 12 , wherein

a potential difference between the second voltage and the sixth voltage is not more than 3 V.

14. The method of driving a semiconductor memory device according to claim 8 , wherein

upon programming in the first p-channel memory transistor, a seventh voltage is applied to the first word line to generate electrons by the band-to-band tunneling caused by an application of the first voltage and the seventh voltage, and the electrons are accelerated by a potential difference between the first voltage and second voltage to be injected into the charge storage layer of the first p-channel memory transistor.

15. The method of driving a semiconductor memory device according to claim 8 , wherein

erasing of the first p-channel memory transistor and the second p-channel memory transistor are made simultaneously.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2025
From: FUJITSU LIMITED
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 073964/0516 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 27, 2024
From: FUJITSU LIMITED
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 069454/0333 →
MERGER Recorded May 24, 2023
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU LIMITED
Reel/Frame 064221/0545 →
CHANGE OF NAME AND CHANGE OF ADDRESS Recorded Jul 16, 2020
From: AIZU FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 053481/0962 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2020
From: FUJITSU SEMICONDUCTOR LIMITED
To: AIZU FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 053209/0468 →
CHANGE OF ADDRESS Recorded Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2013
From: OGAWA, HIROYUKI
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 029886/0599 →