SEMICONDUCTOR DEVICE
A semiconductor device according to this invention includes a support film that supports a lower electrode of a capacitor at an upper portion, and the support film includes a first insulating material having a stress within a range of +700 MPa to −700 MPa. Use of such a support film prevents a phenomenon in which the capacitor lower electrode is twisted. Preferably, the support film has a rate etched by hydrofluoric acid of 1.0 nm/sec or less and more preferably, the support film includes a silicon carbon nitride film.
1 . A semiconductor device comprising:
a capacitor; and
a support film that supports the capacitor, the support film comprising a first insulating material having a stress within a range of +700 MPa to −700 MPa.
2 . The semiconductor device according to claim 1 , wherein the first insulating material has an etch rate relative to hydrofluoric acid of 1 nm/sec or less.
3 . The semiconductor device according to claim 1 , wherein the first insulating material comprises silicon carbon nitride.
4 . The semiconductor device according to claim 3 , wherein the capacitor is a cylindrical capacitor that includes a lower electrode having a cylindrical shape, a capacitor dielectric film formed on inner and outer walls of the lower electrode, and an upper electrode formed on the capacitor dielectric film, and the support film is in contact with the outer wall of the lower electrode.
5 . The semiconductor device according to claim 4 , wherein the semiconductor device comprises a memory cell region in which a plurality of the capacitors is arranged in an array and a peripheral circuit region that is arranged around the memory cell region, and the support film covers a whole of the memory cell region.
6 . The semiconductor device according to claim 5 , wherein the support film has openings near the peripheral circuit region.
7 . The semiconductor device according to claim 5 , wherein the lower electrode comprises a first titanium nitride film and the upper electrode comprises a second titanium nitride film in contact with the capacitor dielectric film and a gap filling material selected from doped polysilicon and boron-doped silicon germanium to fill gaps in the memory cell region.
8 . A semiconductor device comprising:
a capacitor; and
at least two support films separately supporting the capacitor in a height direction thereof and the at least two support films comprising silicon nitride doped with carbon.
9 . The semiconductor device according to claim 8 , wherein the capacitor is a cylindrical capacitor that includes a lower electrode having a cylindrical shape, a capacitor dielectric film formed on inner and outer walls of the lower electrode, and an upper electrode formed on the capacitor dielectric film, and the at least two support films are separately in contact with the outer wall of the lower electrode.
10 . The semiconductor device according to claim 8 , wherein the semiconductor device comprises a memory cell region in which a plurality of the capacitors is arranged in an array and a peripheral circuit region that is arranged around the memory cell region, and the support film covers a whole of the memory cell region.
11 . The semiconductor device according to claim 10 , wherein the memory cell region comprises:
a transistor formed on a semiconductor substrate;
an interlayer insulating film covering the transistor; and
a contact plug extending through the interlayer insulating film, being connected to one of source/drain diffusion layers of the transistor and being electrically connected to the capacitor.
12 . The semiconductor device according to claim 11 , wherein the device further comprises a bottom-holding member that includes an insulating material around a bottom of the lower electrode of each of the capacitors.
13 . The semiconductor device according to claim 12 , wherein the insulating material that constitutes the bottom-holding member comprises silicon nitride doped with carbon.
14 . The semiconductor device according to claim 9 , wherein a thickness of the lower electrode is 10 nm or less.
15 . The semiconductor device according to claim 14 , wherein each thickness of the at least two support films is within a range of 20 nm to 70 nm.
16 . A semiconductor device comprising:
a transistor formed on a semiconductor substrate;
a capacitor comprising a cylindrical lower electrode electrically connected to one of source/drain diffusion layers of the transistor; and
a support structure being in contact with an outer wall of the cylindrical lower electrode at a portion higher than the middle height of the cylindrical lower electrode, the support structure comprising a silicon carbon nitride film.
17 . The semiconductor device according to claim 16 , wherein the support structure comprises at least two films separated each other in a height direction of the cylindrical lower electrode.
18 . The semiconductor device according to claim 16 , wherein the silicon carbon nitride film has a stress within a range of +700 MPa to −700 MPa.
19 . The semiconductor device according to claim 18 , wherein the silicon carbon nitride film has an etch rate relative to hydrofluoric acid of 1 nm/sec or less.
20 . The semiconductor device according to claim 16 , wherein the semiconductor device comprises a memory cell region comprising a plurality of memory cells each including the transistor and the capacitor; and a peripheral circuit region that is arranged around the memory cell region, and the support film covers a whole of the memory cell region.