PATTERNABLE MATERIALS AND METHODS OF USE
A patternable material can be prepared with an elastomeric relief image-forming layer. The patternable material has a relief image-forming elastomeric layer and also has a layer disposed on the entire surface of this elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire surface.
1 . A patternable material comprising:
a relief image-forming elastomeric layer, and
a layer disposed on the relief image-forming elastomeric layer, the layer comprising a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane.
2 . The patternable material of claim 1 , wherein the layer disposed on the relief image-forming elastomeric layer comprises an acid-catalyzed reaction product of a non-fluorinated silicon alkoxide precursor and a hydrolyzable fluoroalkylsilane.
3 . The patternable material of claim 1 , wherein the non-fluorinated metal oxide precursor for the reaction product comprises at least three hydrolyzable groups per metal atom, wherein the hydrolyzable groups are selected from the group consisting of halogen, alkoxy, aryloxy, and carboxy groups.
4 . The patternable material of claim 1 , wherein the hydrolyzable fluoroalkylsilane for the reaction product is represented by the formula:
R 1 -R 2 —Si(X) 3
wherein R 1 is a fluoroalkyl group, R 2 is an aliphatic linking group connecting the fluoroalkyl group to Si, and X is a hydrolyzable group selected from the group consisting of halogen, alkoxy, aryloxy, and carboxy groups.
5 . The patternable material of claim 1 , wherein the layer disposed on the relief image-forming elastomeric layer comprises an acid-catalyzed reaction product of a non-fluorinated silicon oxide precursor and a hydrolyzable fluoroalkylsilane, and this layer has a dry thickness of at least 100 nm and up to and including 5,000 nm.
6 . The patternable material of claim 1 that is a flexographic, intaglio, or gravure printing member having a plate, sleeve, or cylinder format.
7 . The patternable material of claim 1 , wherein the relief image-forming elastomeric layer is disposed on a non-relief image-forming substrate.
8 . The patternable material of claim 1 , wherein the layer disposed on the relief image-forming elastomeric layer further comprises a polymer binder in an amount of up to and including 20 weight %, based on the total layer dry weight.
9 . A method for providing a patterned material useful for printing, the method comprising:
providing a patternable material precursor comprising a relief image-forming elastomeric layer,
applying a reactive composition comprising a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane over the entire surface on the relief image-forming elastomeric layer,
drying and curing the reactive composition to form a layer comprising a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane, and
providing a relief image comprising uppermost surfaces and relief recesses comprising recess walls and recess floors, and simultaneously removing the reaction product from the relief recesses while leaving the reaction product disposed only on the uppermost surfaces,
to form a patterned material useful for printing.
10 . The method of claim 9 , comprising:
providing the relief image by direct laser ablation.
11 . The method of claim 9 , wherein the reactive composition comprises an acid-catalyzed non-fluorinated silicon oxide precursor and a hydrolyzable fluoroalkylsilane.
12 . The method of claim 9 , wherein the non-fluorinated metal oxide precursor in the reactive composition comprises at least three hydrolyzable groups per metal atom, wherein the hydrolyzable groups are selected from the group consisting of halogen, alkoxy, aryloxy, and carboxy groups.
13 . The method of claim 9 , wherein the hydrolyzable fluoroalkylsilane in the reactive composition is represented by the formula:
R 1 -R 2 —Si(X) 3
wherein R 1 is a fluoroalkyl group, R 2 is an aliphatic linking group connecting the fluoroalkyl group to Si, and X is a hydrolyzable group selected from the group consisting of halogen, alkoxy, aryloxy, and carboxy groups.
14 . The method of claim 9 , wherein the reactive composition comprises an acid-catalyzed reaction product of a non-fluorinated silicon oxide precursor and a hydrolyzable fluoroalkylsilane, and the reactive composition is applied, dried, and cured to provide a layer of the reaction product that has a dry thickness of at least 100 nm and up to and including 5,000 nm.
15 . The method of claim 9 , wherein drying and curing is carried out at a temperature of at least 50° C. and up to and including 200° C.