Method for manufacturing semiconductor device with multiple carbon and phosphorus ion implants
A method of manufacturing a semiconductor device, the semiconductor device including a MOS transistor, a source electrode and a drain electrode on the MOS transistor each include a first carbon doped silicon layer including carbon at a first carbon concentration and phosphorus at a first phosphorus concentration and a second carbon doped silicon layer over the first silicon carbide layer, which includes phosphorus at a second phosphorus concentration higher than the first phosphorus concentration, and which includes carbon at a second carbon concentration less than or equal to the first carbon concentration.
1. A method of manufacturing a semiconductor device comprising:
forming a gate insulating film and a gate electrode over a semiconductor substrate;
ion-implanting carbon into the semiconductor substrate in a first dosage with first acceleration energy using the gate electrode as a mask;
ion-implanting phosphorus into the semiconductor substrate in a second dosage with second acceleration energy using the gate electrode as a mask;
forming side wall spacers on both side surfaces of the gate electrode;
ion-implanting carbon into the semiconductor substrate in a third dosage larger than the first dosage with third acceleration energy using the gate electrode and the side wall spacers as masks; and
ion-implanting phosphorus into the semiconductor substrate in a fourth dosage smaller than the second dosage with fourth acceleration energy using the gate electrode and the side wall spacers as masks.
2. The method of manufacturing the semiconductor device according to claim 1 ,
wherein the third acceleration energy is larger than the first acceleration energy and the fourth acceleration energy is larger than the second acceleration energy.
3. The method of manufacturing the semiconductor device according to claim 1 , further comprising:
ion-implanting germanium into the semiconductor substrate before the ion-implanting of carbon in the first dosage.
4. The method of manufacturing the semiconductor device according to claim 3 , further comprising:
ion-implanting germanium into the semiconductor substrate before the ion-implanting of carbon in the third dosage.
5. The method of manufacturing the semiconductor device according to claim 4 ,
wherein the germanium is ion-implanted with a fifth acceleration energy larger than each of the first acceleration energy, the second acceleration energy, the third acceleration energy, and the fourth acceleration energy.