Junction barrier schottky diode and method for manufacturing the same
A junction barrier Schottky diode is formed by shifting second semiconductor regions of a second conductivity type in a staggered shape in a first semiconductor region of a first conductivity type so that pn junction regions are formed at predetermined distances between the second semiconductor regions and the first semiconductor region. A third semiconductor region of the first conductivity type is formed between the second semiconductor regions in order to form a Schottky junction region. An electrode is formed on the second and third semiconductor regions. The second semiconductor regions arranged at equal distances in an X direction are formed in a plurality of columns in a Y direction. An amount of shift between adjacent columns in the X direction is set such that a Y-direct ion distance between the second semiconductor regions in the different columns is larger than an X-direction distance between the second semiconductor regions in each column.
1. A junction barrier Schottky diode, comprising:
a first semiconductor region of a first conductivity type formed on a semiconductor substrate;
a plurality of second semiconductor regions of a second conductivity type that are formed in a staggered arrangement in the first semiconductor region, pn junction regions being formed at predetermined distances between the plurality of second semiconductor regions and the first semiconductor region;
a third semiconductor region of the first conductivity type that is formed between the second semiconductor regions in order to form a Schottky junction region; and
an electrode formed on the second and third semiconductor regions,
wherein each of the second semiconductor regions has a quadrangular shape in plan view from the electrode,
wherein the staggered arrangement comprises a plurality of staggered rows extending in an X direction and a plurality of overlapping columns extending in a Y direction, wherein the second semiconductor regions within each row of the plurality of staggered rows are arranged with an equal X-direction spacing, and
wherein an amount of shift along the X direction between adjacent columns of the plurality of columns is set such that a Y-direction distance between adjacent second semiconductor regions of the adjacent columns is larger than the X-direction spacing.
2. The junction barrier Schottky diode according to claim 1 , wherein the quadrangular shape of each of the second semiconductor regions is any of a square, a rectangle, and a parallelogram.
3. A junction barrier Schottky diode, comprising:
a first semiconductor region of a first conductivity type formed on a semiconductor substrate;
a plurality of second semiconductor regions of a second conductivity type that are formed in a plurality of rows and columns in the first semiconductor region, pn junction regions being formed at predetermined distances between the plurality of second semiconductor regions and the first semiconductor region;
a third semiconductor region of the first conductivity type that is formed between the second semiconductor regions in order to form a Schottky junction region; and
an electrode formed on the second and third semiconductor regions, wherein
each of the second semiconductor regions has a quadrangular shape having a side extending along a first direction with a length “b” in plan view from the electrode, and
a distance between adjacent second semiconductor regions in along a second direction crossing the first direction is larger than a distance “c”, wherein the distance c is defined between adjacent second semiconductor regions along the first direction, and an amount of shift “d” along the first direction between adjacent second semiconductor regions in adjacent columns satisfies a relationship of (c/2)≦d≦(b+c/2).
4. The junction barrier Schottky diode according to claim 3 , wherein the quadrangular shape of each of the second semiconductor regions is any of a square, a rectangle, and a parallelogram.
5. A junction barrier Schottky diode, comprising:
a first semiconductor region of a first conductivity type formed on a semiconductor substrate;
a plurality of second semiconductor regions of a second conductivity type that are formed in a plurality of rows and columns in the first semiconductor region, pn junction regions being formed at predetermined distances between the plurality of second semiconductor regions and the first semiconductor region;
a third semiconductor region of the first conductivity type that is formed between the second semiconductor regions in order to form a Schottky junction region; and
an electrode formed on the second and third semiconductor regions, wherein
each of the second semiconductor regions has a quadrangular shape having a side extending along a first direction with a length “b” in plan view from the electrode, and
an extendable size of a depletion layer from an edge of each second semiconductor region when a predetermined reverse voltage is applied is represented by a first distance “a” in the plan view, a second distance between adjacent second semiconductor regions along the first direction is (a√2), a distance between adjacent second semiconductor regions in a second direction crossing the first direction is (a+a/√2), and an amount of shift “d” along the first direction between adjacent second semiconductor regions in adjacent columns satisfies a relationship of (a/√2)≦d≦(b+a/√2).
6. The junction barrier Schottky diode according to claim 5 , wherein the quadrangular shape of each of the second semiconductor regions is any of a square, a rectangle, and a parallelogram.
7. The junction barrier Schottky diode according to claim 5 , wherein the amount of shift d between the adjacent second semiconductor regions in adjacent columns is (b/2).
8. The junction barrier Schottky diode according to claim 5 , wherein the predetermined reverse voltage is an allowable reverse voltage.