IP Library › Granted Patent US 9,640,440
Granted Patent Utility
US 9,640,440 · Confirmation No. 3133

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH WIDER SIDEWALL SPACER FOR A HIGH VOLTAGE MISFET

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2017-04-12 ISSUE.NTF Issue Notification 1 View
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2016-12-23 NOA Notice of Allowance and Fees Due (PTOL-85) 8 View
2016-12-23 SRNT Examiner's search strategy and results 5 View
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2016-12-23 BIB Bibliographic Data Sheet 1 View
2016-12-23 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 3 View
2016-12-23 SRFW Search information including classification, databases and other search related notes 1 View
2016-11-03 WFEE Fee Worksheet (SB06) 1 View
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2016-11-03 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
2016-11-03 SPEC Specification 1 View
2016-11-03 CLM Claims 5 View
2016-11-03 REM Applicant Arguments/Remarks Made in an Amendment 1 View
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2016-08-26 CTNF Non-Final Rejection 13 View
2016-08-26 892 List of references cited by examiner 1 View
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2016-08-26 SRFW Search information including classification, databases and other search related notes 1 View
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2016-07-28 NTC.PUB Notice of Publication 1 View
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Quick Facts
Patent No.
US 9,640,440
App. No.
15/089,932
Filed
2016-04-04
Granted
2017-05-02
Pub. No.
US20160218040A1
Art Unit
2826
PTA
0 days