Heated gas-bearing backer
A gas-levitated substrate backing system includes a gas-levitating backer structure which is used for providing a non-contact force onto a surface of a substrate. The gas-levitating backer structure has an output face including three or more output openings. A gas source provides a gas flow through the output openings to levitate the gas-levitating backer structure over the surface of the substrate. The gas-levitating backer structure is freely moveable in a direction normal to the surface of the substrate.
1. A gas-levitated substrate backing system for providing heat and a non-contact force onto a surface of a substrate, comprising:
a gas-levitating backer structure having an output face, wherein the output face includes three or more output openings;
a gas source for providing a gas flow through the output openings; and
a heater for heating the gas-levitating backer structure;
a lateral constraint system that constrains the movement of the gas-levitating backer structure in a plane parallel to the surface of the substrate while enabling the gas-levitating backer structure to move in a direction normal to the surface of the substrate;
wherein the gas-levitating backer structure fits within an opening in the lateral constraint system or the lateral constraint system includes a flexure attached to the gas-levitating backer structure;
wherein the gas flow through the output face is controlled to lift the gas-levitating backer structure away from the surface of the substrate such that there is no mechanical contact between the gas-levitating backer structure and the surface of the substrate while providing the non-contact force onto the surface of the substrate, and wherein a gap between the output face and the surface of the substrate is controlled by the gas flow.
2. The gas-levitated substrate backing system of claim 1 , wherein the gas-levitating backer structure includes a porous material layer of a porous material, the porous material layer having an outer surface facing the surface of the substrate and an inner surface facing a gas manifold, wherein pores in the porous material provide the output openings, and wherein the output face corresponds to the outer surface of the porous material layer.
3. The gas-levitated substrate backing system of claim 1 , wherein the gas-levitating backer structure heats the surface of the substrate by conductive heating.
4. The gas-levitated substrate backing system of claim 1 , wherein the gas flow through the output face is controlled such that a gap between the output face and the surface of the substrate is no more than 50 μm.
5. The gas-levitated substrate backing system of claim 1 , wherein the flexure includes a means for conveying energy to the gas-levitating backer structure or conveying electrical signals to or from the gas-levitating backer structure.
6. The gas-levitated substrate backing system of claim 1 , wherein the lateral constraint system includes a gas supply tube which supplies gas to the gas-levitating backer structure.
7. The gas-levitated substrate backing system of claim 1 , wherein the non-contact force applied to the surface of the substrate is no more than 1.0 pounds per square inch of the output face.
8. The gas-levitated substrate backing system of claim 1 , wherein the surface of the substrate is oriented in a horizontal orientation.
9. The gas-levitated substrate backing system of claim 8 , wherein the gas-levitating backer structure applies a net force on the surface of the substrate corresponding to a weight of the gas-levitated substrate backing system.
10. The gas-levitated substrate backing system of claim 1 , further including a vacuum-preloaded gas bearing having an output face, the vacuum-preloaded gas bearing being positioned in a fixed location on an opposite side of the substrate from the gas-levitating backer structure with the output face of the vacuum-preloaded gas bearing facing the opposite side of the substrate.
11. The gas-levitated substrate backing system of claim 10 , wherein the vacuum-preloaded gas bearing is a thin film deposition head which deposits a thin film of material onto the opposite side of the substrate.
12. The gas-levitated substrate backing system of claim 1 , further including a substrate positioning system that moves the substrate in a lateral direction parallel to the output face of the gas-levitating backer structure according to a specified motion pattern.
13. The gas-levitated substrate backing system of claim 1 , wherein the heater is a resistive heater.
14. The gas-levitated substrate backing system of claim 1 , wherein the heater is inside the gas-levitating backer structure.
15. The gas-levitated substrate backing system of claim 1 , wherein a surface area of the substrate is greater than an area of the output face.