Method of providing photopatterned functional surfaces
An article is prepared with surface regions having different contact angles. A reactive silane material is attached to a surface having a reactive tail component that is contacted with a first corresponding reactant, followed by imagewise UV exposure to cause imagewise reaction of the reactive tail component and first corresponding reactant, forming reacted regions and latent reaction regions. After rinsing, a second corresponding reactant that is capable of reaction with the reactive moiety is applied. Uniform UV exposure leads to a second reaction product only in the latent reaction regions. After rinsing, first regions comprise exclusively the first reaction product and second regions comprising exclusively the second reaction product. These first and second regions have contact angles that differ by 10-110 degrees. A composition can be applied that is exclusively attracted to either the first regions or the second regions, but not to both the first and second regions.
1. A method for providing an article, the method comprising, in order:
providing an inert substrate having first and opposing second supporting surfaces, and the inert substrate having on the first supporting surface thereof, a reactive silane material comprising a head silane component attached to the first supporting surface, and a reactive tail component comprising a reactive moiety selected from the group consisting of a thiol moiety, an ene moiety, an yne moiety, an azide moiety, and a tetrazolyl moiety;
forming a reactive surface by contacting the reactive silane material on the first supporting surface with a solution comprising a first corresponding reactant capable of reaction with the reactive moiety;
imagewise UV exposing the reactive surface to cause imagewise reaction of the reactive moiety with the first corresponding reactant, forming reacted regions and latent reaction regions on the reactive surface, the reacted regions comprising a first reaction product of the reactive moiety with the first corresponding reactant, the first reaction product being absent in the latent reaction regions on the reactive surface;
rinsing away non-reacted first corresponding reactant;
contacting the reactive surface having both reacted regions and latent reaction regions with a second corresponding reactant that is capable of reaction with the reactive moiety, and subsequently or simultaneously UV exposing the reactive surface to form a second reaction product of the reactive moiety with the second corresponding reactant only in the latent reaction regions;
rinsing away non-reacted second corresponding reactant to form a modified first supporting surface on the inert substrate, which modified first supporting surface has first regions comprising exclusively the first reaction product and second regions comprising exclusively the second reaction product, wherein the first and second regions have static contact angles that differ by at least 10 degrees and up to and including 110 degrees; and
providing a composition on the modified first supporting surface, which composition is exclusively attracted to either the first regions or the second regions, but not to both the first and second regions, on the modified first supporting surface.
2. The method of claim 1 , wherein the first and second regions have static contact angles that differ by at least 30 degrees and up to and including 80 degrees.
3. The method of claim 1 , wherein the first and second regions have static contact angles that differ by at least 35 degrees and up to and including 75 degrees.
4. The method of claim 1 , wherein the reactive moiety is an ene moiety, and the first corresponding reactant is a thiol moiety, and the second corresponding reactant is a thiol moiety or a tetrazole moiety.
5. The method of claim 1 , wherein the composition comprises seed metal catalysts, and the method further comprises electrolessly plating the composition on the modified first supporting surface.
6. The method of claim 1 , wherein the composition is provided on the modified first supporting surface in a pattern, and the method further comprises:
patternwise transferring the composition from the modified first supporting surface to a receiver material, to form an imaged pattern corresponding to either the first regions or the second regions, but not to both the first and second regions, on the receiver material.
7. The method of claim 1 , wherein the composition provided on the modified first supporting surface has a viscosity of at least 1 centipoise (0.001 Pascal sec) and up to and including 300 centipoise (0.3 Pascal sec).
8. The method of claim 1 , wherein the composition is provided on the modified first supporting surface at a coverage of at least 5 g/m 2 and up to and including 200 g/m 2 .
9. The method of claim 1 , wherein the inert substrate comprises a flexible glass.
10. The method of claim 1 , wherein forming the reactive surface and imagewise UV exposing the reactive surface are carried out sequentially.
11. The method of claim 1 , for providing the modified first supporting surface having hydrophilic regions and hydrophobic regions on the inert substrate.
12. The method of claim 1 , wherein the inert substrate is transparent.
13. The method of claim 12 , wherein the imagewise UV exposing is carried out through the opposing second supporting surface of the inert substrate.