Optical devices with bandwidth enhancing structures

1. A light-emitting device, comprising:

a substrate having a first surface and an opposing second surface;

an epitaxial structure having a first surface and an opposing second surface, the second surface of the epitaxial structure being positioned in proximity with the first surface of the substrate;

a first metal layer having a first surface and an opposing second surface, the second surface of the first metal layer facing toward the first surface of the substrate; and

at least one light confinement structure configured to confine light produced within the epitaxial structure, wherein the at least one light confinement structure provides a low-refraction index boundary that confines the light in a mesa structure that is at least partially surrounded by the at least one light confinement structure;

wherein the at least one light confinement structure includes a trench in the second surface of the epitaxial structure that at least partially surrounds the mesa structure, and

wherein the first metal layer is in the trench and extends along an entire width of the mesa structure in a cross sectional view.

2. The light-emitting device of claim 1 , further comprising:

a second metal layer on the first surface of the epitaxial structure, the second metal layer including an opening that allows emission of the light.

3. The light-emitting device of claim 2 , further comprising:

a passivation layer between the first metal layer and the epitaxial structure, wherein the passivation layer includes a portion in the trench, and wherein the trench completely surrounds the mesa structure.

4. The light-emitting device of claim 1 , wherein the at least one light confinement structure comprises one or more un-etched areas of the epitaxial structure that are interspersed between etched areas of the epitaxial structures.

5. The light-emitting device of claim 4 , wherein proportions of the one or more un-etched areas and proportions of the etched areas are selected to balance a desired index-guiding provided by the at least one light confinement structure with scattering losses induced by the at least one light confinement structure.

6. The light-emitting device of claim 5 , wherein the etched areas bound the un-etched areas to create separate light-confinement regions of the at least one light confinement structure.

7. The light-emitting device of claim 6 , wherein the separate light-confinement regions comprise one or more spoke-shaped structures that extend from a center of the mesa structure.

8. The light-emitting device of claim 2 , wherein the epitaxial structure comprises a first distributed Bragg reflector (DBR) stack and a quantum well (QW) region.

9. The light-emitting device of claim 8 , wherein the epitaxial structure further comprises a second DBR stack and wherein the QW region is sandwiched between the first DBR stack and the second DBR stack.

10. The light-emitting device of claim 9 , wherein the first DBR stack comprises a p-type doping, wherein the second DBR stack comprises an n-type doping, and wherein the first DBR stack is closer to the substrate than the second DBR stack.

11. The light-emitting device of claim 10 , wherein the mesa structure further comprises:

a first contact surrounded by the trench, wherein the substrate comprises a high thermal-conductivity non-native substrate, and wherein the first contact is reflective and in contact with a p-type material.

12. The light-emitting device of claim 11 , further comprising a passivation layer positioned between the first metal layer and the epitaxial structure.

13. A semiconductor device, comprising:

a non-native substrate; and

a vertical cavity surface emitting laser (VCSEL) having a first side and a second side that faces toward the non-native substrate, wherein laser light produced by the VCSEL is emitted through the first side of the VCSEL, wherein the VCSEL comprises:

an epitaxial structure;

a first metal layer sandwiched between the non-native substrate and the epitaxial layer; and

a light confinement structure configured to confine light produced within the epitaxial structure, wherein the light confinement structure provides a low-refraction index boundary that confines light in a mesa structure that is at least partially surrounded by the light confinement structure;

wherein the light confinement structure includes a trench in the epitaxial structure that at least partially surrounds the mesa structure, and

wherein the first metal layer is in the trench and extends along an entire width of the mesa structure in a cross sectional view.

14. The semiconductor device of claim 13 , wherein the trench completely surrounds the mesa structure.

15. The semiconductor device of claim 13 , wherein the light confinement structure comprises one or more un-etched areas of the light confinement structure that are interspersed between etched areas of the light confinement structure, wherein proportions of the one or more un-etched areas and proportions of the etched areas are selected to balance a desired index-guiding provided by the light confinement structure with scattering losses induced by the light confinement structure.

16. The semiconductor device of claim 15 , wherein the etched areas bound the un-etched areas to create separate light-confinement regions.

17. The semiconductor device of claim 16 , wherein the separate light-confinement regions comprise one or more spoke-shaped structures that extended directly from a center of the mesa structure.

18. The semiconductor device of claim 13 , wherein the epitaxial structure comprises a first distributed Bragg reflector (DBR) stack, a second DBR stack, and a quantum well (QW) region sandwiched between the first DBR stack and the second DBR stack, wherein the first DBR stack is positioned closer to the non-native substrate than the second DBR stack, and wherein the first DBR stack comprises a p-type doping.

19. A Vertical Cavity Surface Emitting Laser (VCSEL) die, comprising:

an epitaxial structure;

a contact layer positioned in proximity to the epitaxial structure; and

a light confinement structure configured to confine light produced within the epitaxial structure and, in conjunction with the contact layer, to cause the confined light to emit away from the contact layer, wherein the light confinement structure provides a low-refraction index boundary that confines light in a mesa structure that is at least partially surrounded by the light confinement structure;

wherein the light confinement structure includes a trench in the epitaxial structure that at least partially surrounds the mesa structure, and

wherein the first metal layer is in the trench and extends along an entire width of the mesa structure in a cross sectional view.

20. The VCSEL die of claim 19 , wherein the light confinement structure comprises one or more un-etched areas of the epitaxial layer that are interspersed between etched areas of the epitaxial layer, and wherein proportions of the one or more un-etched areas and proportions of the etched areas are selected to balance a desired index-guiding provided by the light confinement structure with scattering losses induced by the light confinement structure.