Three-dimensional semiconductor memory device including slit with lateral surfaces having periodicity
According to one embodiment, it includes a stacked body including N-number of layers (N is an integer of 2 or more) stacked on a semiconductor substrate, opening portions penetrating the stacked body in a stacking direction, columnar bodies respectively disposed in the opening portions, and a slit dividing M-number of layers (M is an integer of 1 or more and (N−2) or less) of the stacked body in a horizontal direction from above, wherein the slit is formed with lateral surfaces respectively having a spatial periodicity in a horizontal plane.
1. A semiconductor device comprising:
a stack including a plurality of conductive layers and a plurality of insulating layers alternately stacked in a first direction, the plurality of conductive layers including a first conductive layer as a selection gate electrode and a plurality of second conductive layers as word lines;
a slit dividing the first conductive layer into a first region and a second region in a second direction crossing the first direction and extending in a third direction crossing the first and the second directions, the slit not dividing the plurality of second conductive layers, the slit including an insulating material;
a plurality of first columns respectively extending in the first direction through the first region of the first conductive layer and respectively including a first charge accumulating layer;
a plurality of second columns respectively extending in the first direction through the second region of the first conductive layer and respectively including a second charge accumulating layer;
a plurality of first plug electrodes provided on the plurality of first columns; and
a plurality of second plug electrodes provided on the plurality of second columns,
wherein
the slit has a first surface that faces the first region of the first conductive layer and a second surface that faces the second region of the first conductive layer,
the first columns and the second columns are arranged at a pitch in the third direction, and
the first surface and the second surface have waveform shapes that are shifted from each other by a half of the pitch in the third direction.
2. The semiconductor device according to claim 1 , wherein
the plurality of first columns and the plurality of second columns are disposed opposite to each other with the slit interposed therebetween.
3. The semiconductor device according to claim 1 , wherein
the plurality of first columns and the plurality of second columns that are disposed opposite to each other with the slit interposed therebetween are shifted from each other by the half of the pitch in the third direction.
4. The semiconductor device according to claim 1 , wherein
a minimum value of a width of the slit is smaller than a distance between two adjacent ones of the plurality of first columns or the plurality of second columns.
5. The semiconductor device according to claim 1 , wherein
the first and the second surfaces of the slit have a spatial period equal to the pitch in the third direction.
6. The semiconductor device according to claim 1 , wherein
a diameter of each of the plurality of first columns and the plurality of second columns is 90 to 110 nm.
7. The semiconductor device according to claim 1 , wherein
a distance between two adjacent ones of the plurality of first columns or the plurality of second columns is 40 to 60 nm.
8. The semiconductor device according to claim 1 , wherein
a minimum value of a width of the slit is 40 nm or less.