Semiconductor device assemblies including low-stress spacer
In a general aspect, a semiconductor device assembly can include a substrate, a semiconductor die disposed on the substrate, a thermally conductive spacer having a first side and a second side, the second side being opposite the first side. The first side of the thermally conductive spacer can include a plurality of steps that are coupled with the substrate. The first side of the thermally conductive spacer can also include a surface that is disposed between the plurality of steps, where the surface can be coupled with the semiconductor die.
1. A semiconductor device assembly comprising:
a first direct-bonded metal (DBM) substrate;
a semiconductor die disposed on the first DBM substrate;
a thermally conductive spacer having a first side and a second side, the second side being opposite the first side,
the first side of the thermally conductive spacer including:
a plurality of steps including at least four steps that are respectively coupled with the first DBM substrate, each step of the at least four steps being included on a respective corner of the first side of the thermally conductive spacer; and
a surface disposed between the plurality of steps, the surface being coupled with the semiconductor die; and
a second DBM substrate coupled with the second side of the thermally conductive spacer.
2. The semiconductor device assembly of claim 1 , further comprising a molding compound encapsulating the semiconductor device assembly such that a surface of the first DBM substrate is exposed through a first surface of the molding compound and a surface of the second DBM substrate is exposed through a second surface of the molding compound, the second surface of the molding compound being opposite the first surface of the molding compound.
3. The semiconductor device assembly of claim 1 , wherein a first side of the semiconductor die is coupled with the first DBM substrate and a second side of the semiconductor die, opposite the first side of the semiconductor die, is coupled with the surface of the thermally conductive spacer disposed between the plurality of steps.
4. The semiconductor device assembly of claim 3 , wherein
the thermally conductive spacer is electrically conductive; and
the first DBM substrate is configured to electrically isolate the thermally conductive spacer from the first side of the semiconductor die.
5. The semiconductor device assembly of claim 1 , wherein the plurality of steps are monolithically formed with the thermally conductive spacer.
6. The semiconductor device assembly of claim 1 , wherein the second side of the thermally conductive spacer is planar.
7. A semiconductor device assembly comprising:
a first substrate disposed on a first side of the semiconductor assembly;
a first semiconductor die coupled with the first substrate via a first adhesive material;
a first thermally conductive spacer having a first side and a second side, the second side of the first thermally conductive spacer being opposite the first side of the first thermally conductive spacer,
the first side of the first thermally conductive spacer including:
a plurality of steps that are coupled with the first substrate; and
a surface disposed between the plurality of steps, the surface being coupled with the first semiconductor die;
a second substrate disposed on a second side of the semiconductor device assembly, the second side of the semiconductor device assembly being opposite the first side of the semiconductor device assembly;
a second semiconductor die coupled with the second substrate via second adhesive material; and
a second thermally conductive spacer having a first side and a second side, the second side of the second thermally conductive spacer being opposite the first side of the second thermally conductive spacer,
the first side of the second thermally conductive spacer including:
a plurality of steps that are coupled with the second substrate; and
a surface disposed between the plurality of steps, the surface being coupled with the second semiconductor die.
8. The semiconductor device assembly of claim 7 , further comprising:
a third substrate coupled to the second side of the first thermally conductive spacer; and
a fourth substrate coupled to the second side of the second thermally conductive spacer.
9. The semiconductor device assembly of claim 8 , wherein:
the first substrate is a first direct-bonded metal (DBM) substrate;
the second substrate is a second DBM substrate;
the third substrate is a third DBM substrate; and
the fourth substrate is a fourth DBM substrate.
10. The semiconductor device assembly of claim 9 , further comprising a molding compound encapsulating the semiconductor device assembly such that:
a surface of the first substrate is exposed through a first surface of the molding compound;
a surface of the second substrate is exposed through a second surface of the molding compound, the second surface of the molding compound being opposite the first surface of the molding compound;
a surface of the third substrate is exposed through the second surface of the molding compound; and
a surface of the fourth substrate is exposed through the first surface of the molding compound.
11. The semiconductor device assembly of claim 7 , wherein the plurality of steps of the first thermally conductive spacer includes:
a first step extending along a first edge of the first side of the first thermally conductive spacer; and
a second step extending along a second edge of the first side of the first thermally conductive spacer.
12. The semiconductor device assembly of claim 7 , wherein the plurality of steps of the second thermally conductive spacer includes:
a first step disposed in a first corner of the first side of the second thermally conductive spacer;
a second step disposed in a second corner of the first side of the second thermally conductive spacer;
a third step disposed in a third corner of the first side of the second thermally conductive spacer; and
a fourth step disposed in a fourth corner of the first side of the second thermally conductive spacer.
13. The semiconductor device assembly of claim 7 , wherein:
the plurality of steps of the first thermally conductive spacer are monolithically formed with the first thermally conductive spacer; and
the plurality of steps of the second thermally conductive spacer are monolithically formed with the second thermally conductive spacer.
14. The semiconductor device assembly of claim 7 , wherein:
the second side of the first thermally conductive spacer is planar; and
the second side of the second thermally conductive spacer is planar.
15. A semiconductor device assembly comprising:
a first direct-bonded metal (DBM) substrate;
a semiconductor die disposed on the first DBM substrate;
a thermally conductive spacer having a first side and a second side, the second side being opposite the first side,
the first side of the thermally conductive spacer including:
a first step disposed in a first corner of the first side of the thermally conductive spacer;
a second step disposed in a second corner of the first side of the thermally conductive spacer;
a third step disposed in a third corner of the first side of the thermally conductive spacer;
a fourth step disposed in a fourth corner of the first side of the thermally conductive spacer; and
a surface disposed between the steps of the thermally conductive spacer, the surface being coupled with the semiconductor die;
a second DBM substrate coupled with the second side of the thermally conductive spacer, the second side of the thermally conductive spacer being planar; and
a molding compound encapsulating the semiconductor device assembly such that a surface of the first DBM substrate is exposed through a first surface of the molding compound and a surface of the second DBM substrate is exposed through a second surface of the molding compound, the second surface of the molding compound being opposite the first surface of the molding compound.
16. The semiconductor device assembly of claim 15 , wherein the first step, the second step, the third step and fourth step are monolithically formed with the thermally conductive spacer.