IP Library Granted Patent US 11,613,805
Granted Patent B2
US 11,613,805 · App. 16/786,228 · Granted Mar 28, 2023

Systems and methods for optimal source material deposition along hole edges

Inventors: Michael N. Task (Vernon, CT); Russell A. Beers (Manchester, CT)
Assignee: RAYTHEON TECHNOLOGIES CORPORATION
C23C14/325C23C14/046C23C14/14F23R3/002H01J37/32055H01J37/32614F23M2900/05004F23R2900/00018Y02T50/60
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Quick Facts
Patent No.
US 11,613,805
App. No.
16/786,228
Granted
Mar 28, 2023
Kind
B2
Abstract

A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

Claims (27)

1. A system for depositing a coating of a source material onto at least one panel, the at least one panel defining an edge and a front panel surface, the system comprising:

a cathodic arc including a target surface, the target surface disposed along a target deposition axis, and able to emit the source material as both a cloud of source material vapor and a generally conical stream of liquid particles of the source material, the cloud of source material vapor used to coat the edge with the source material to provide an edge coating; and

a coating deposition structure, the coating deposition structure configured and dimensioned to position one or both of the cathodic arc and the panel, such that the panel is positioned relative to the target surface based on a deposition plane, the deposition plane being defined by the target deposition axis, wherein the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles; and

a cathodic arc positioning member, the cathodic arc positioning member configured and dimensioned to position the cathodic arc, such that the panel is positioned relative to the target surface based on the deposition plane and the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles.

2. The system of claim 1 , wherein the coating deposition structure is configured and dimensioned to position the panel substantially perpendicular to the target deposition axis.

3. The system of claim 1 , wherein the panel defines at least one hole, the edge is a hole edge of the at least one hole, and the edge coating is a hole edge coating.

4. The system of claim 1 , further comprising a controller, the controller configured to send signals to an actuator to align one or both of the cathodic arc and the panel.

5. The system of claim 1 , wherein the coating deposition structure further comprises a panel positioning member, the panel positioning member configured and dimensioned to position the panel, such that the panel is positioned relative to the target surface based on the deposition plane.

6. A system for depositing a coating of a source material onto at least one panel, the at least one panel defining an edge and a front panel surface, the system comprising:

a cathodic arc including a target surface, the target surface disposed along a target deposition axis and the target deposition axis defines a deposition plane, and able to emit the source material as both a cloud of source material vapor and a generally conical stream of liquid particles of the source material, the cloud of source material vapor used to coat the edge with the source material to provide an edge coating; and

a coating deposition structure, the coating deposition structure configured and dimensioned to position one or both of the cathodic arc and the panel, such that the panel is positioned relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles of the source material; and

a cathodic arc positioning member, the cathodic arc positioning member configured and dimensioned to position the cathodic arc, such that the panel is positioned relative to the target surface based on the deposition angle and the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles.

7. The system of claim 6 , wherein the coating deposition structure is configured and dimensioned to position the panel substantially perpendicular to the target deposition axis.

8. The system of claim 6 , wherein the panel defines at least one hole, the edge is a hole edge of the at least one hole, and the edge coating is a hole edge coating.

9. The system of claim 6 , further comprising a controller, the controller configured to send signals to an actuator to align one or both of the cathodic arc and the panel.

10. The system of claim 6 , wherein the coating deposition structure further comprises a panel positioning member, the panel positioning member configured and dimensioned to position the panel, such that the panel is positioned relative to the target surface based on the deposition angle.

11. A deposition system comprising:

a cathodic arc including a target surface, the target surface disposed along a target deposition axis and the target deposition axis defines a deposition plane;

a coating deposition structure; and

a panel defining an edge and a front panel surface;

wherein the cathodic arc is configured and dimensioned to emit a source material as both a cloud of source material vapor and a generally conical stream of liquid particles of the source material, the cloud of source material vapor used to coat the edge with the source material to provide an edge coating;

wherein the coating deposition structure is configured and dimensioned to position one or both of the cathodic arc and the panel, such that the panel is positioned relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles of the source material; and

wherein the coating deposition structure further comprises a cathodic arc positioning member, the cathodic arc positioning member configured and dimensioned to position the cathodic arc, such that the panel is positioned relative to the target surface based on the deposition angle and the entire panel is positioned and maintained above or below the deposition plane and within the generally conical stream of liquid particles.

12. The system of claim 11 , wherein the coating deposition structure is configured and dimensioned to position the panel substantially perpendicular to the target deposition axis.

13. The system of claim 11 , wherein the panel defines at least one hole, the edge is a hole edge of the at least one hole, and the edge coating is a hole edge coating.

14. The system of claim 11 , further comprising a controller, the controller configured to send signals to an actuator to align one or both of the cathodic arc and the panel.

15. The system of claim 11 , wherein the coating deposition structure further comprises a panel positioning member, the panel positioning member configured and dimensioned to position the panel, such that the panel is positioned relative to the target surface based on the deposition angle.

Assignments (4)
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064714/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE AND REMOVE PATENT APPLICATION NUMBER 11886281 AND ADD PATENT APPLICATION NUMBER 14846874. TO CORRECT THE RECEIVING PARTY ADDRESS PREVIOUSLY RECORDED AT REEL: 054062 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF ADDRESS. Recorded Mar 4, 2021
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 055659/0001 →
CHANGE OF NAME Recorded Sep 4, 2020
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 054062/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2020
From: TASK, MICHAEL; BEERS, RUSSELL
To: UNITED TECHNOLOGIES CORPORATION
Reel/Frame 051787/0365 →
Continuity (2)
Division 14632158 · Feb 26, 2015
Related Publication 20200181760A1 · Jun 11, 2020