IP Library Granted Patent US 12,523,630
Granted Patent B2
US 12,523,630 · App. 17/605,757 · Granted Jan 13, 2026

Manufacturing method for gas sensor element, gas sensor element, and gas sensor

Inventor: Kazuma Ito (Nagoya, JP)
Assignee: Niterra Co., Ltd.
G01N27/409G01N27/4073G01N27/4075
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Quick Facts
Patent No.
US 12,523,630
App. No.
17/605,757
Granted
Jan 13, 2026
Kind
B2
Abstract

A method for manufacturing a gas sensor element ( 100 ) including a solid electrolyte ( 110 ) and an electrode ( 130 ) formed on a surface ( 110 a ) of the solid electrolyte ( 110 ). The method includes: a slurry application step S 3 of forming a first slurry layer ( 13 ) by applying a first slurry containing monoclinic zirconia and tetragonal/cubic zirconia to the surface ( 110 a ) of the solid electrolyte ( 110 ); a heat treatment step S 4 of forming a base layer ( 14 ) by a heat treating the solid electrolyte ( 110 ) having the first slurry layer ( 13 ) formed thereon; and a plating step S 5 of forming the electrode ( 130 ) by plating the base layer ( 14 ) using a plating solution containing a noble metal.

Claims (23)

1 . A gas sensor element comprising a solid electrolyte and an electrode formed on a surface of the solid electrolyte, wherein

the electrode contains monoclinic zirconia, tetragonal/cubic zirconia, and a noble metal,

the electrode is a single layer electrode,

the noble metal is contained in a proportion of 85 mass % or less with respect to a total mass of the electrode, and

a content of the monoclinic zirconia in the single layer electrode is not less than 40 mass % and not greater than 90 mass % with respect to 100 mass % of a total amount of the monoclinic zirconia and the tetragonal/cubic zirconia.

2 . A gas sensor comprising:

the gas sensor element according to claim 1 ; and

a metal shell holding the gas sensor element.

3 . A method for manufacturing a gas sensor element according to claim 1 , the method comprising:

a slurry application step of forming a first slurry layer by applying a first slurry containing monoclinic zirconia and tetragonal/cubic zirconia to the surface of the solid electrolyte;

a heat treatment step of forming a base layer by heat treating the solid electrolyte having the first slurry layer formed thereon; and

a plating step of forming the electrode by plating the base layer using a plating solution containing a noble metal,

wherein the electrode is a single layer electrode,

the noble metal is contained in a proportion of 85 mass % or less with respect to a total mass of the electrode,

a content of the monoclinic zirconia in the single layer electrode is not less than 40 mass % and not greater than 90 mass % with respect to 100 mass % of a total amount of the monoclinic zirconia and the tetragonal/cubic zirconia.

4 . The method for manufacturing the gas sensor element as claimed in claim 3 , wherein the content of the monoclinic zirconia in the first slurry is not less than 40 mass % and not greater than 70 mass % with respect to 100 mass % of the total amount of the monoclinic zirconia and the tetragonal/cubic zirconia.

5 . A method for manufacturing a gas sensor element according to claim 1 , the method comprising:

a slurry application step of forming a second slurry layer by applying a second slurry containing monoclinic zirconia, tetragonal/cubic zirconia, and a noble metal to the surface of the solid electrolyte; and

a heat treatment step of forming the electrode by heat treating the solid electrolyte having the second slurry layer formed thereon,

wherein the electrode is a single layer electrode, and

the noble metal is contained in a proportion of 85 mass % or less with respect to a total mass of the electrode, and

a content of the monoclinic zirconia in the second slurry is not less than 40 mass % and not greater than 90 mass % with respect to 100 mass % of a total amount of the monoclinic zirconia and the tetragonal/cubic zirconia.

6 . The method for manufacturing the gas sensor element as claimed in claim 5 , wherein the content of the monoclinic zirconia in the second slurry is not less than 40 mass % and not greater than 70 mass % with respect to 100 mass % of the total amount of the monoclinic zirconia and the tetragonal/cubic zirconia.

Assignments (2)
CHANGE OF NAME Recorded Sep 7, 2023
From: NGK SPARK PLUG CO., LTD.
To: NITERRA CO., LTD.
Reel/Frame 064842/0215 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 22, 2021
From: ITO, KAZUMA
To: NGK SPARK PLUG CO., LTD.
Reel/Frame 057878/0981 →
Priority Claims (1)
JP 2019-106265 · Jun 6, 2019 · national
Continuity (1)
Related Publication 20220214303A1 · Jul 7, 2022
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