OPTICALLY ACTIVATED OBJECT MASS TRANSFER SYSTEM
A transfer system includes a transfer layer formed of a thermally switchable material that undergoes a phase change when heated. A side of the transfer layer is placed in contact with an outward-facing side of a chiplet during a transfer operation. An optical absorber material is located on at least one of the outward facing side of the chiplet or an inward facing side of the chiplet. An optical energy source is operable to apply optical energy to the optical absorber material through the transfer layer to selectively heat a region of the transfer layer that corresponds to a location of the chiplet. The region holds the chiplet when the optical energy is removed during the transfer operation. The region is subsequently heated during the transfer operation to release the chiplet.
1 . A transfer system, comprising:
a transfer layer formed of a thermally switchable material that undergoes a phase change when heated, a side of the transfer layer being placed in contact with an outward-facing side of a chiplet during a transfer operation;
an optical absorber material on at least one of the outward facing side of the chiplet or an inward facing side of the chiplet; and
an optical energy source operable to apply optical energy to the optical absorber material through the transfer layer to selectively heat a region of the transfer layer that corresponds to a location of the chiplet, the region holding the chiplet when the optical energy is removed during the transfer operation, the region being subsequently heated during the transfer operation to release the chiplet, wherein the transfer layer is reusable for repeated transfer operations.
2 . The transfer system of claim 1 , wherein the optical absorber material is a thin film applied to the outward facing side or inward facing side of the chiplet.
3 . The transfer system of claim 2 , wherein the chiplet is optically transparent at a wavelength of the optical energy, and wherein the thin film is applied at the inward facing side of the chiplet.
4 . The transfer system of claim 1 , wherein a portion of the chiplet is formed of the optical absorber material.
5 . The transfer system of claim 1 , wherein the optical absorber material comprises one of or a combination of metal, carbon, and semiconductor.
6 . The transfer system of claim 1 , wherein the optical absorber material is a patterned, non-uniform layer.
7 . The transfer system of claim 1 , wherein the optical absorber material is integral with electrical contacts of the chiplet.
8 . The transfer system of claim 1 , further comprising:
an optically transparent conductive layer in thermal contact with the transfer layer; and
two or more electrodes coupled to pass an electrical current across the optically transparent conductive layer, the electrical current heating the transparent conductive layer to non-selectively perform the subsequent heating of the transfer layer.
9 . The transfer system of claim 1 , further comprising:
a conductive mesh in thermal contact with the transfer layer; and
two or more electrodes coupled to pass an electrical current across the conductive mesh, the electrical current heating the conductive mesh to non-selectively perform the subsequent heating of the transfer layer.
10 . The transfer system of claim 1 , wherein the thermally switchable material comprises a shaped memory polymer.
11 . The transfer system of claim 10 wherein the shaped memory polymer comprises stearyl acrylate.
12 . The transfer system of claim 1 , wherein the optical energy source is a scanned laser beam.
13 . The transfer system of claim 1 , wherein the subsequent heating is performed by optical exposure, laser irradiation, infrared lamp heating, electrical joule heating, inductive heating, radio-frequency heating, hot plate heating, conductive heating, convection heating, forced air, or a combination thereof.
14 . The transfer system of claim 1 , wherein the transfer layer contacts a second chiplet that is not proximate the heated region of the transfer layer, the second chiplet not being held by the transfer layer during the transfer operation.
15 . The transfer system of claim 14 , wherein the second chiplet does not include the optical absorber material, and wherein the optical energy is applied to the second chiplet during the transfer operation.
16 . The transfer system of claim 14 , wherein the second chiplet includes the optical absorber material on at least one of a second outward facing side of the chiplet or a second inward facing side of the second chiplet, and wherein the optical energy is not applied to the second chiplet during the transfer operation.
17 . A method, comprising:
causing a transfer layer of a transfer head to contact a chiplet at a first side of the transfer layer;
apply optical energy to selectively heat an optical absorber material on the chiplet causing heating in a region of the transfer layer corresponding to a location of the chiplet, the transfer layer formed of a thermally switchable material that undergoes a phase change when heated resulting in the region of the transfer layer conforming to the chiplet;
removing the optical energy to cause the transfer layer to hold the chiplet;
moving the transfer head relative to a donor substrate or surface to move the chiplet; and
subsequently heating the region of the transfer layer to release the chiplet, wherein the transfer layer is reusable for repeated transfer operations.
18 . The method of claim 17 , wherein the optical absorber material is a thin film applied to an outward facing side or an inward facing side of the chiplet.
19 . The method of claim 18 , wherein the chiplet is optically transparent at a wavelength of the optical energy, and wherein the thin film is applied at the inward facing side of the chiplet.
20 . The method of claim 17 , wherein the transfer layer contacts a second chiplet that is not proximate the heated region of the transfer layer, the second chiplet not being held by the transfer layer during the transfer operation.
21 . The method of claim 17 , wherein the subsequently heating comprises non-selectively heating the transfer layer.
22 . The method of claim 17 , wherein the transfer layer contacts a second chiplet that is not proximate the heated region of the transfer layer, and wherein the optical energy is applied to the second chiplet during the transfer operation the second chiplet not having the optical absorber material and not being held by the transfer layer during the transfer operation.
23 . The method of claim 17 , wherein the transfer layer contacts a second chiplet that is not proximate the heated region of the transfer layer, and wherein the optical energy is not applied to the second chiplet during the transfer operation, the second chiplet having the optical absorber material and not being held by the transfer layer during the transfer operation.
24 . The method of claim 17 , further comprising thermally cycling the transfer layer above and below a glass transition temperature after a transfer operation to smooth out surface features formed on transfer layer by the chiplet.