LATTICE STRUCTURE THICKNESSES

1 . A method, comprising:

producing, by a processor, a density determination of a lattice structure;

producing, by the processor, a beam thickness determination of the lattice structure; and

adjusting a beam thickness of the lattice structure based on the density determination and the beam thickness determination.

2 . The method of claim 1 , further comprising:

determining whether a density threshold is satisfied based on the density determination; and

determining whether a thickness threshold is satisfied based on the beam thickness determination.

3 . The method of claim 2 , wherein the method further comprises, in a case that one of the density threshold and the thickness threshold is not satisfied:

determining a thermal map; and

determining a re-radiation map.

4 . The method of claim 3 , wherein adjusting the beam thickness of the lattice structure is based on the thermal map and the re-radiation map.

5 . The method of claim 4 , wherein adjusting the beam thickness is performed for a layer of the lattice structure, and wherein the method further comprises, in response to determining that the layer is not a last layer of the lattice structure:

producing a second density determination and a second beam thickness determination for a second layer; and

adjusting a second beam thickness of the second layer based on the second density determination and the second beam thickness determination.

6 . The method of claim 2 , wherein the method further comprises uniformly adjusting the beam thickness in a case that the density threshold is not satisfied and the thickness threshold is not satisfied.

7 . The method of claim 1 , wherein adjusting the beam thickness comprises determining an adjusted beam thickness based on the beam thickness determination.

8 . The method of claim 1 , wherein determining the adjusted beam thickness comprises looking up the adjusted beam thickness based on the beam thickness determination.

9 . The method of claim 1 , wherein the lattice structure is a homogeneous lattice structure.

10 . An apparatus, comprising:

a memory; and

a processor coupled to the memory, wherein the processor is to:

determine a thermal map of a lattice structure;

determine a re-radiation map of the lattice structure; and

adjust a thickness of the lattice structure based on the thermal map and the re-radiation map.

11 . The apparatus of claim 10 , wherein the lattice structure is a heterogeneous lattice structure.

12 . The apparatus of claim 10 , wherein adjusting the thickness comprises increasing the thickness in a region of the lattice structure where a temperature of the thermal map is below a temperature threshold.

13 . A non-transitory tangible computer-readable medium comprising instructions when executed cause a processor of an electronic device to:

produce a lattice structure type determination indicating whether a lattice structure is a homogeneous lattice structure or a heterogeneous lattice structure; and

adjust a beam thickness of the lattice structure based on the lattice structure type determination.

14 . The non-transitory tangible computer-readable medium of claim 13 , further comprising instructions when executed cause the processor to:

determine, in a case that the lattice structure type determination indicates a heterogeneous lattice structure, a thermal map of the lattice structure and a re-radiation map of the lattice structure; and

determine an adjusted beam thickness based on the thermal map and the re-radiation map to adjust the beam thickness.

15 . The non-transitory tangible computer-readable medium of claim 14 , further comprising instructions when executed cause the processor to determine the adjusted beam thickness based on a density determination and a beam thickness determination in a case that the lattice structure type determination indicates a homogeneous lattice structure.