Patent Assignment
Reel/Frame 004339/0061
Assignment of Assignors Interest.
Recorded: 1984-11-28
Pages: 1
Assignee
NEC CORPORATION
33-1, SHIBA 5-CHOME, MINATO-KU, A CORP. OF JAPAN, TOKYO, JAPAN
Covered Property
(1)
Method of Manufacturing Semiconductor Device Having Polycrystalline Silicon Layer with Metal Silicide Film
Patent:
4,716,131 →
Application:
06/675,768 →
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.