IP Library Assignment 006879/0080
Patent Assignment
Reel/Frame 006879/0080

Change of Name

Recorded: 1994-02-28 Pages: 8
Assignor
Assignee
JAPAN ENERGY CORPORATION
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties (2)
Silicide Targets for Sputtering and Method of Manufacturing the Same
Patent: 5,464,520 →
Application: 08/094,283 →
Diffusion-Bonded Sputtering Target Assembly and Method of Manufacturing the Same
Application: 08/122,738 →
Related Assignments (4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 19, 1993
From: KANO, OSAMU; YASUI, KOICHI; SATO, YASUYUKI; YAMAKOSHI, YASHUIRO
To: NIKKO KYODO CO., LTD.
Reel/Frame 006637/0881 →
Assignment of Assignor's Interest Sep 16, 1993
From: OHHASHI, TATEO; FUKUYO, HIDEAKI; SAWAMURA, ICHIROH; NAKAMURA, KENICHIROU
To: NIKKO KYODO CO., LTD.
Reel/Frame 006749/0139 →
Assignment of Assignor's Interest Dec 12, 2003
From: JAPAN ENERGY CORPORATION
To: NIKKO MATERIALS COMPANY, LIMITED
Reel/Frame 014186/0839 →
Change of Name/Merger Jun 9, 2011
From: NIKKO MATERIALS CO., LTD
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 026417/0430 →