IP Library › Granted Patent US 5,464,520
Granted Patent Utility
US 5,464,520 · App. 08/094,283

Silicide targets for sputtering and method of manufacturing the same

Inventors: Osamu Kano, Koichi Yasui, Yasuyuki Sato, Yasuhiro Yamakoshi, Junichi Anan, Hironori Wada, Akio Yasuoka
Patented Case View Patent ↗
Granted: Nov 7, 1995 Filed: Jul 19, 1993
Inventors
Osamu Kano
Koichi Yasui
Yasuyuki Sato
Yasuhiro Yamakoshi
Junichi Anan
Hironori Wada
Akio Yasuoka
Assignee (at issue)
Japan Energy Corporation

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 5,464,520
App. No.
08/094,283
Filed
1993-07-19
Granted
1995-11-07
Kind
A