Assignment of Assignor's Interest

Recorded: 1996-01-16 Pages: 3

Assignors

HORAI, MASATAKE

Executed: 1994-04-08

ADACHI, NAOSHI

Executed: 1994-04-08

NISHIKAWA, HIDESHI

Executed: 1994-04-08

SANO, MASAKAZU

Executed: 1994-04-08

Assignee

SUMITOMO SITIX CORPORATION

1, HIGASHIHAMA-CHO, AMAGASAKI-SHI, HYOGO, 660, JAPAN

Covered Property (1)

Method of Annealing a Semiconductor Wafer in a Hydrogen Atmosphere to Desorb Surface Contaminants

Patent: 5,508,207 →

Application: 08/199,170 →

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.