Assignment of Assignor's Interest

Recorded: 1996-03-10 Pages: 2

Assignor

MATSUBARA, YOSHIHISA

Executed: 1996-03-05

Assignee

NEC CORPORATION

7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN

Covered Property (1)

Method of Forming Silicide Film

Patent: 5,963,829 →

Application: 08/617,647 →

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.