Patent Assignment
Reel/Frame 008210/0754
Assignment of Assignor's Interest
Recorded: 1996-11-05
Pages: 3
Assignor
SIEMENS COMPONENTS, INC.
Executed: 1996-10-28
Assignee
SIEMENS AKTIENGESELLSCHAFT
MUNICH, GERMANY
Covered Property
(1)
Borderless Contact Etch Process with Sidewall Spacer and Selective Isotropic Etch Process
Patent:
5,960,318 →
Application:
08/549,884 →
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
May 26, 2010
From: PESCHKE, MATTHIAS L.
To: SIEMENS COMPONENTS, INC.
Reel/Frame 024434/0735 →
Assignment of Assignor's Interest
Jun 9, 2010
From: SIEMENS AKTIENGESELLSCHAFT
To: INFINEON TECHNOLOGIES AG
Reel/Frame 024505/0274 →
Assignment of Assignor's Interest
Jun 14, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 024626/0001 →
Assignment of Assignor's Interest
Jul 6, 2010
From: STENGL, REINHARD JOHANNES
To: SIEMENS COMPONENTS, INC.
Reel/Frame 024630/0724 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →