Patent Assignment
Reel/Frame 008796/0108
Assignment of Assignor's Interest
Recorded: 1997-09-05
Pages: 3
Assignor
NAKAJIMA, KEN
Executed: 1997-09-03
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Method of Extracting a Mask Pattern for an Electron Beam Exposure
Patent:
6,007,949 →
Application:
08/924,535 →
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.