IP Library Assignment 009574/0186
Patent Assignment
Reel/Frame 009574/0186

Assignment of Assignor's Interest

Recorded: 1998-11-05 Pages: 4
Assignors
LEE, BUAN HENG
Executed: 1998-10-27
LOW, TECK HONG
Executed: 1998-10-27
WANG, HAI RONG
Executed: 1998-10-27
YING, TANG
Executed: 1998-10-27
LAM, ZADIG CHERNG-CHING
Executed: 1998-10-27
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
60 WOODLANDS INDUSTRIAL PARK D, STREET 2, SINGAPORE, 73840, SINGAPORE
Covered Property (1)
N Type Impurity Doping Using Implantation of P2+ Ions or AS2+ Ions
Patent: 6,982,215 →
Application: 09/186,388 →
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Nov 17, 2020
From: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
To: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
Reel/Frame 054452/0402 →
Change of Name Nov 18, 2020
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 054476/0123 →
Assignment of Assignor's Interest Nov 19, 2020
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 054482/0525 →