IP Library Assignment 010734/0529
Patent Assignment
Reel/Frame 010734/0529

Assignment of Assignor's Interest

Recorded: 2000-04-18 Pages: 3
Assignor
DEL PUERTO, SANTIAGO E.
Executed: 2000-04-17
Assignee
SILICON VALLEY GROUP, INC.
101 METRO DRIVE, SUITE 40, SAN JOSE, CALIFORNIA, 95110
Covered Property (1)
Photoresist Outgassing Miltgation System Method and Apparatus for in-Vacuum Lithography
Patent: 6,369,874 →
Application: 09/551,531 →
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name, Conversion, Merger, and Confirmatory Assignment Mar 31, 2004
From: SILICON VALLEY GROUP, INC.; ASML US, INC.; ASM LITHOGRAPHY, INC. AND ASML US, LLC; ASML US, INC.
To: ASML US, INC.; ASML US, LLC; ASML US, INC.; ASML HOLDING N.V.
Reel/Frame 014462/0273 →