IP Library Assignment 014462/0273
Patent Assignment
Reel/Frame 014462/0273

Change of Name, Conversion, Merger, and Confirmatory Assignment

Recorded: 2004-03-31 Pages: 26
Assignors
SILICON VALLEY GROUP, INC.
Executed: 2001-11-01
ASML US, INC.
Executed: 2002-10-04
ASML US, INC.
Executed: 2003-10-09
Assignees
ASML US, INC.
8555 SOUTH RIVER PARKWAY, TEMPE, ARIZONA, 85284
ASML US, LLC
1209 ORANGE STREET, WILMINGTON, DELAWARE, 19801
ASML US, INC.
8555 SOUTH RIVER PARKWAY, TEMPE, ARIZONA, 85284
ASML HOLDING N.V.
DE RUN 6501, VELDHOVEN, NL-5504 DR, NETHERLANDS
Covered Properties (33)
Dual-Stage Lithography Apparatus and Method
Application: 09/449,630 →
Calcium Fluoride (CAF2) Stress Plate and Method of Making the Same
Patent: 6,324,003 →
Application: 09/471,484 →
Removable Cover for Protecting a Reticle, System Including and Method of Using the Same
Patent: 6,239,863 →
Application: 09/473,710 →
Method and Apparatus for a Reticle with Purged Pellicle-to-Reticle Gap
Patent: 6,507,390 →
Application: 09/501,180 →
Apparatus and Method of Cleaning Reticles for Use in a Lithography Tool
Patent: 6,387,602 →
Application: 09/504,539 →
Zoom illumination system for use in photolithography
Patent: 6,307,682 →
Application: 09/504,719 →
Scanning framing blade apparatus
Patent: 6,307,619 →
Application: 09/534,127 →
Photoresist Outgassing Miltgation System Method and Apparatus for in-Vacuum Lithography
Patent: 6,369,874 →
Application: 09/551,531 →
Method and System for Selective Linewidth Optimization During a Lithographic Process
Patent: 6,509,952 →
Application: 09/575,997 →
Flexible Piezoelectric Chuck and Method of Using the Same
Patent: 6,556,281 →
Application: 09/575,998 →
System and method for a mountable and removable sensor apparatus
Application: 09/679,388 →
Method and Apparatus for in-Situ Lithography Mask Cleaning
Patent: 6,589,354 →
Application: 09/753,665 →
Publication: US 2002/0083957
Method and apparatus for optical system coherence testing
Application: 09/783,406 →
Method and Apparatus for Optimizing the Output Beam Characteristics of a Laser
Patent: 6,570,713 →
Application: 09/793,126 →
Publication: US 2002/0118721
Lithographic Tool with Dual Isolation System and Method for Configuring the Same
Patent: 6,538,720 →
Application: 09/794,133 →
Publication: US 2002/0118346
Apparatus, System, and Method for Precision Positioning and Alignment of a Lens in an Optical System
Patent: 6,556,364 →
Application: 09/841,108 →
Publication: US 2001/0033437
Optical Reduction System with Elimination of Reticle Diffraction Induced Bias
Patent: 6,522,483 →
Application: 09/841,166 →
Publication: US 2002/0027718
Method and Apparatus for a Non-Contact Scavenging Seal
Patent: 6,559,922 →
Application: 09/846,386 →
Publication: US 2001/0038442
Method for Characterizing Optical Systems Using Holographic Reticles
Patent: 7,242,464 →
Application: 09/907,902 →
Publication: US 2002/0021460
Discrete Time Trajectory Planner for Lithography System
Patent: 6,760,641 →
Application: 09/923,397 →
Publication: US 2003/0060921
Method and system of varying optical imaging performance in the presence of refractive index variations
Application: 09/986,106 →
Publication: US 2002/0085185
Method and Apparatus for a Reticle with Purged Pellicle-to-Reticle Gap
Patent: 6,847,434 →
Application: 10/314,419 →
Publication: US 2003/0123042
Optical Reduction System with Elimination of Reticle Diffraction Induced Bias
Patent: 6,836,380 →
Application: 10/366,614 →
Publication: US 2003/0223126
Lithographic Tool with Dual Isolation System and Method for Configuring the Same
Patent: 7,164,463 →
Application: 10/369,569 →
Publication: US 2003/0164931
Apparatus System and Method for Precision Positioning and Alignment of a Lens in an Optical System
Patent: 6,760,167 →
Application: 10/403,027 →
Publication: US 2003/0202260
Apparatus and method for optical system coherence tests
Application: 60/182,510 →
Catadioptric optical reduction system with control of laser illumination polarization
Application: 60/199,381 →
Catadioptric optical reduction system with elimination of reticle diffraction induced bias
Application: 60/199,392 →
Apparatus, system, and method for precision alignment of a lens in an optical system
Application: 60/199,393 →
Apparatus, system and method for active compensation of astigmatism in a catadioptric optical system
Application: 60/199,400 →
system and method for characterizing optical systems using holographic reticles
Application: 60/219,187 →
Method and system for correcting projection optic aberrations due to altitude specific barometric pressure variations
Application: 60/246,065 →
Method, system, and computer program product for determining refractive index distribution
Application: 60/288,782 →
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 30, 1999
From: ROUX, STEPHEN; BEDNAREK, TODD JOSEPH
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010426/0110 →
Assignment of Assignor's Interest Dec 23, 1999
From: MARTIN, GENE JAY
To: SILICON VALLEY GROUP
Reel/Frame 010484/0337 →
Assignment of Assignor's Interest Feb 10, 2000
From: IVALDI, JORGE
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010560/0023 →
Assignment of Assignor's Interest Apr 6, 2000
From: CATEY, ERIC; HULT, DAVID; DEL PUERTO, SANTIAGO; ROUX, STEPHEN
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010739/0858 →
Assignment of Assignor's Interest Apr 18, 2000
From: DEL PUERTO, SANTIAGO E.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010734/0529 →
Assignment of Assignor's Interest May 23, 2000
From: HAYDEN, CINDY J.; PETERSON, DAVID H.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010837/0901 →
Assignment of Assignor's Interest Jun 7, 2000
From: HOFFMAN, JEFFREY M.; OSKOTSKY, MARK; RYZHIKOV, LEV; KUNICK, JOSEPH M.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010865/0495 →
Assignment of Assignor's Interest Oct 3, 2000
From: GOVIL, PRADEEP KUMAR; IVALDI, JORGE
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011207/0308 →
Assignment of Assignor's Interest Oct 3, 2000
From: GOVIL, PRADEEP KUMAR; TSACOYEANES, JAMES
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011207/0928 →
Assignment of Assignor's Interest Oct 5, 2000
From: GALBURT, DANIEL N.; TAM, WAIMING
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011230/0254 →
Assignment of Assignor's Interest Oct 5, 2000
From: CATEY, ERIC B.; HULT, DAVID A.; ROUX, STEPHEN; BEDNAREK, TODD J.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011198/0693 →
Assignment of Assignor's Interest Jan 4, 2001
From: REID, PAUL B.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011420/0551 →
Assignment of Assignor's Interest Feb 27, 2001
From: BITTENSON, STEVEN N.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011576/0613 →
Assignment of Assignor's Interest Feb 28, 2001
From: GALBURT, DANIEL N.; KOCHERSPERGER, PETER C.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011574/0910 →
Assignment of Assignor's Interest May 2, 2001
From: HANSELL, ERIC C.; HERRERA, JOSE V.; HUSE, RICHARD L.; IVALDI, JORGE S.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011771/0945 →
Assignment of Assignor's Interest Jul 19, 2001
From: HANSEN, MATTHEW E.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 012011/0333 →
Assignment of Assignor's Interest Aug 8, 2001
From: WIENER, ROBERTO B.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 012065/0551 →
Assignment of Assignor's Interest Aug 10, 2001
From: KREUZER, JUSTIN L.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 012063/0001 →
Assignment of Assignor's Interest Aug 29, 2001
From: MEEHAN, MICHAEL F.; TAUB, DAVID G.; GALBURT, DANIEL N.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 012142/0718 →
Assignment of Assignor's Interest Nov 7, 2001
From: HELMUS, JUNE L.; MCCULLOUGH, ANDREW W.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 012299/0890 →
Assignment of Assignor's Interest Dec 4, 2003
From: LAGANZA, JOSEPH; IVALDI, JORGE; LUO, FLORENCE
To: ASML HOLDING N.V.
Reel/Frame 014756/0119 →
Change of Name, Conversion, Merger, and Confirmatory Assignment Mar 24, 2004
From: SILICON VALLEY GROUP, INC.; ASML US, INC.; ASM LITHOGRAPHY, INC. AND ASML US, LLC; ASML US, INCORPORATED
To: ASML US, INC.; ASML US, LLC; ASML US, INC.; ASML HOLDING N.V.
Reel/Frame 014438/0708 →
Change of Name Aug 20, 2019
From: SILICON VALLEY GROUP, INC.
To: ASML US, INC.
Reel/Frame 050111/0612 →
Confirmatory Assignment Aug 20, 2019
From: ASML US, INC.
To: ASML HOLDING N.V.
Reel/Frame 050111/0147 →
Conversion Aug 20, 2019
From: ASML US, INC.
To: ASML US, LLC
Reel/Frame 050111/0139 →